Vertically scaled MOSFET gate stacks and junctions: How far are we likely to go?
- Carlton M. Osburn
- , Indong Kim
- , Sungkee Han
- , Indranil De
- , Kam F. Yee
- , Shyam Gannavaram
- , Sung Joo Lee
- , Chung Ho Lee
- , Zhijiong J. Luo
- , Wenjuan Zhu
- , John R. Hauser
- , Dim Lee Kwong
- , Gerald Lucovsky
- , T. P. Ma
- , Mehmet C. Öztürk
- North Carolina State University
- KLA-Tencor Corporation
- Access Network Division
- Intel
- University of Texas at Austin
- Yale University
Research output: Contribution to journal › Review article › peer-review
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