TY - JOUR
T1 - van der Waals Gap-Engineered Artificial Crystals
T2 - A Platform for Tunable Physical Properties and Emerging Device Applications
AU - Min, Jinhong
AU - Kim, Jihyun
AU - Won, Sang Min
AU - Kang, Joohoon
N1 - Publisher Copyright:
© 2025 American Chemical Society.
PY - 2025
Y1 - 2025
N2 - Artificial crystals, composed of artificially assembled 2D atomic layers, represent a versatile platform for tailoring material properties beyond the limitations of naturally occurring layered systems. The development of scalable fabrication techniques has accelerated their transition toward practical applications in electronics, optoelectronics, and quantum devices. Beyond assembly strategies, the precise modulation of the van der Waals gap (vdWG) between adjacent layers has been recognized as a critical approach for tailoring the fundamental properties of artificial crystals. vdWG engineering─achieved through methods such as intercalation, mechanical compression, and chemical functionalization─enables systematic tuning of interlayer coupling, band alignment, charge transport, excitonic behavior, and structural phase. These advances provide a versatile foundation for integrating vdWG-engineered artificial crystals into high-performance transistors, photodetectors, superconducting devices, and spintronic platforms. In this perspective, we comprehensively examine fabrication methodologies for artificial crystals and categorize existing vdWG engineering strategies. Then, the discussion expands to the influences of the controlled interlayer spacing toward material properties. Their potential for next-generation technological applications is examined while addressing critical challenges to fully realize the potential of vdWG-engineered artificial crystals in real-world device applications.
AB - Artificial crystals, composed of artificially assembled 2D atomic layers, represent a versatile platform for tailoring material properties beyond the limitations of naturally occurring layered systems. The development of scalable fabrication techniques has accelerated their transition toward practical applications in electronics, optoelectronics, and quantum devices. Beyond assembly strategies, the precise modulation of the van der Waals gap (vdWG) between adjacent layers has been recognized as a critical approach for tailoring the fundamental properties of artificial crystals. vdWG engineering─achieved through methods such as intercalation, mechanical compression, and chemical functionalization─enables systematic tuning of interlayer coupling, band alignment, charge transport, excitonic behavior, and structural phase. These advances provide a versatile foundation for integrating vdWG-engineered artificial crystals into high-performance transistors, photodetectors, superconducting devices, and spintronic platforms. In this perspective, we comprehensively examine fabrication methodologies for artificial crystals and categorize existing vdWG engineering strategies. Then, the discussion expands to the influences of the controlled interlayer spacing toward material properties. Their potential for next-generation technological applications is examined while addressing critical challenges to fully realize the potential of vdWG-engineered artificial crystals in real-world device applications.
KW - artificial crystals
KW - electronics
KW - gap engineering
KW - nanodevice
KW - optoelectronics
KW - quantum electronics
KW - spintronics
KW - two-dimensional materials
KW - van der Waals gap
UR - https://www.scopus.com/pages/publications/105010543823
U2 - 10.1021/acsnano.5c07172
DO - 10.1021/acsnano.5c07172
M3 - Review article
C2 - 40645919
AN - SCOPUS:105010543823
SN - 1936-0851
JO - ACS Nano
JF - ACS Nano
ER -