V-defects and dislocations in InGaN/GaN heterostructures

  • A. M. Sánchez
  • , M. Gass
  • , A. J. Papworth
  • , P. J. Goodhew
  • , P. Singh
  • , P. Ruterana
  • , H. K. Cho
  • , R. J. Choi
  • , H. J. Lee

Research output: Contribution to journalArticlepeer-review

Abstract

In the growth of InGaN/GaN multi-quantum well (MQW) heterostructures by metal organic chemical vapor deposition, V-defects attached to threading dislocations have been observed and investigated. Energy-dispersive X-ray analysis and conventional transmission electron microscopy studies were carried out in order to determine the In composition and investigate the behavior of the dislocations. The V-defects are limited by {101̄1} lattice planes, they are attached to threading dislocations and may start at the third quantum well. The associated dislocation runs up into the overgrown GaN layer. Some (a+c) dislocations were shown to decompose inside the multi-quantum well, giving rise to a misfit segment in the c-plane and a V-shape defect.

Original languageEnglish
Pages (from-to)316-320
Number of pages5
JournalThin Solid Films
Volume479
Issue number1-2
DOIs
StatePublished - 23 May 2005
Externally publishedYes

Fingerprint

Dive into the research topics of 'V-defects and dislocations in InGaN/GaN heterostructures'. Together they form a unique fingerprint.

Cite this