Unprecedented Hole Concentration of NiSe2 Electrodes Leading to Hole Degeneration of Entire WSe2 Channels

  • Ji Kwon Bae
  • , Soheil Ghods
  • , Hyeon Ho Cho
  • , Hochan Jang
  • , Seung Il Kim
  • , Jae Hyun Lee
  • , Hak Ki Yu

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

Semimetal electrodes for 2D semiconductors have been extensively studied; however, research on p-type semimetals has been limited due to the scarcity of materials that satisfy both high work functions and low resistances. In response, we investigated the behavior of NiSe2 as an electrode. Utilizing a novel co-evaporation method that suppresses oxidation and contamination, we synthesized NiSe2 demonstrating a high work function of 5.53 eV, a low resistance of 5.81 × 10-5 Ω cm, and a record hole concentration exceeding 1023 cm-3. We confirmed that when WSe2 comes into contact with NiSe2, the Fermi level of WSe2 falls below the work function of NiSe2, leading to complete hole degeneration of the channel. This unusual Fermi level alignment correlates with the high hole concentration in NiSe2 and the maximum energy level of its hole pockets. Our research provides new insights into how an electrode’s hole concentration affects channel behavior.

Original languageEnglish
Pages (from-to)13381-13387
Number of pages7
JournalNano Letters
Volume24
Issue number42
DOIs
StatePublished - 23 Oct 2024
Externally publishedYes

Keywords

  • hole concentration
  • NiSe
  • p-type device
  • p-type electrode
  • semimetal
  • WSe FET

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