Uniformity of internal linear-type inductively coupled plasma source for flat panel display processing

Jong Hyeuk Lim; Kyong Nam Kim; Jung Kyun Park; Jong Tae Lim; Geun Young Yeom

doi:10.1063/1.2840997

Uniformity of internal linear-type inductively coupled plasma source for flat panel display processing

Jong Hyeuk Lim, Kyong Nam Kim, Jung Kyun Park, Jong Tae Lim, Geun Young Yeom

Department of Advanced Materials Science and Engineering

Sungkyunkwan University

Research output: Contribution to journal › Article › peer-review

18 Scopus citations

Abstract

The variation in plasma uniformity over an extremely large size inductively coupled plasma (ICP) source of 2750×2350 mm2 was examined. An internal linear-type antenna called "double comb-type antenna" was used as the ICP source. A plasma density of ∼1.4× 1011 cm3 could be obtained at 5 mTorr Ar by applying 10 kW rf power to the source at a frequency of 13.56 MHz. An increase in rf power from 1 to 10 kW improved the plasma uniformity over a substrate area of 2300×2000 mm2 from 18.1% to 11.4%. The improvement in uniformity of the internal ICP source was attributed to the increase in plasma density near the wall.

Original language	English
Article number	051504
Journal	Applied Physics Letters
Volume	92
Issue number	5
DOIs	https://doi.org/10.1063/1.2840997
State	Published - 2008

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title = "Uniformity of internal linear-type inductively coupled plasma source for flat panel display processing",

abstract = "The variation in plasma uniformity over an extremely large size inductively coupled plasma (ICP) source of 2750×2350 mm2 was examined. An internal linear-type antenna called {"}double comb-type antenna{"} was used as the ICP source. A plasma density of ∼1.4× 1011 cm3 could be obtained at 5 mTorr Ar by applying 10 kW rf power to the source at a frequency of 13.56 MHz. An increase in rf power from 1 to 10 kW improved the plasma uniformity over a substrate area of 2300×2000 mm2 from 18.1\% to 11.4\%. The improvement in uniformity of the internal ICP source was attributed to the increase in plasma density near the wall.",

author = "Lim, \{Jong Hyeuk\} and Kim, \{Kyong Nam\} and Park, \{Jung Kyun\} and Lim, \{Jong Tae\} and Yeom, \{Geun Young\}",

year = "2008",

doi = "10.1063/1.2840997",

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volume = "92",

journal = "Applied Physics Letters",

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AU - Lim, Jong Hyeuk

AU - Kim, Kyong Nam

AU - Park, Jung Kyun

AU - Lim, Jong Tae

AU - Yeom, Geun Young

PY - 2008

Y1 - 2008

N2 - The variation in plasma uniformity over an extremely large size inductively coupled plasma (ICP) source of 2750×2350 mm2 was examined. An internal linear-type antenna called "double comb-type antenna" was used as the ICP source. A plasma density of ∼1.4× 1011 cm3 could be obtained at 5 mTorr Ar by applying 10 kW rf power to the source at a frequency of 13.56 MHz. An increase in rf power from 1 to 10 kW improved the plasma uniformity over a substrate area of 2300×2000 mm2 from 18.1% to 11.4%. The improvement in uniformity of the internal ICP source was attributed to the increase in plasma density near the wall.

AB - The variation in plasma uniformity over an extremely large size inductively coupled plasma (ICP) source of 2750×2350 mm2 was examined. An internal linear-type antenna called "double comb-type antenna" was used as the ICP source. A plasma density of ∼1.4× 1011 cm3 could be obtained at 5 mTorr Ar by applying 10 kW rf power to the source at a frequency of 13.56 MHz. An increase in rf power from 1 to 10 kW improved the plasma uniformity over a substrate area of 2300×2000 mm2 from 18.1% to 11.4%. The improvement in uniformity of the internal ICP source was attributed to the increase in plasma density near the wall.

UR - https://www.scopus.com/pages/publications/38949184497

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DO - 10.1063/1.2840997

M3 - Article

AN - SCOPUS:38949184497

SN - 0003-6951

VL - 92

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 5

M1 - 051504

ER -

Uniformity of internal linear-type inductively coupled plasma source for flat panel display processing

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