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Transient Response of h-BN-Encapsulated Graphene Transistors: Signatures of Self-Heating and Hot-Carrier Trapping

  • Jubin Nathawat
  • , Miao Zhao
  • , Chun Pui Kwan
  • , Shenchu Yin
  • , Nargess Arabchigavkani
  • , Michael Randle
  • , Harihara Ramamoorthy
  • , Guanchen He
  • , Ratchanok Somphonsane
  • , Naoki Matsumoto
  • , Kohei Sakanashi
  • , Michio Kida
  • , Nobuyuki Aoki
  • , Zhi Jin
  • , Yunseob Kim
  • , Gil Ho Kim
  • , Kenji Watanabe
  • , Takashi Taniguchi
  • , Jonathan P. Bird

Research output: Contribution to journalArticlepeer-review

Abstract

We use transient electrical measurements to investigate the details of self-heating and charge trapping in graphene transistors encapsulated in hexagonal boron nitride (h-BN) and operated under strongly nonequilibrium conditions. Relative to more standard devices fabricated on SiO 2 substrates, encapsulation is shown to lead to an enhanced immunity to charge trapping, the influence of which is only apparent under the combined influence of strong gate and drain electric fields. Although the precise source of the trapping remains to be determined, one possibility is that the strong gate field may lower the barriers associated with native defects in the h-BN, allowing them to mediate the capture of energetic carriers from the graphene channel. Self-heating in these devices is identified through the observation of time-dependent variations of the current in graphene and is found to be described by a time constant consistent with expectations for nonequilibrium phonon conduction into the dielectric layers of the device. Overall, our results suggest that h-BN-encapsulated graphene devices provide an excellent system for implementations in which operation under strongly nonequilibrium conditions is desired.

Original languageEnglish
Pages (from-to)4082-4090
Number of pages9
JournalACS Omega
Volume4
Issue number2
DOIs
StatePublished - 22 Feb 2019
Externally publishedYes

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