Transfer characteristics of H202-Doped ZrlnZnO thin film transistors

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Abstract

Solution-processed zirconium-indium-zinc-oxide thin-film transistors (ZIZO TFTs) were fabricated with and without hydrogen peroxide (H2O2). With an incorporation of H2O2 into the channel layer, threshold voltage shift under positive bias stress were improved. We realized the reduced trap density of ZIZO TFTs with 2 M H2O2 incorporation.

Original languageEnglish
Title of host publication26th International Display Workshops, IDW 2019
PublisherInternational Display Workshops
Pages515-517
Number of pages3
ISBN (Electronic)9781713806301
StatePublished - 2019
Externally publishedYes
Event26th International Display Workshops, IDW 2019 - Sapporo, Japan
Duration: 27 Nov 201929 Nov 2019

Publication series

NameProceedings of the International Display Workshops
Volume2
ISSN (Print)1883-2490

Conference

Conference26th International Display Workshops, IDW 2019
Country/TerritoryJapan
CitySapporo
Period27/11/1929/11/19

Keywords

  • Hydrogen peroxide
  • Positive bias stress
  • Solution-process
  • TFTs
  • ZrInZnO

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