Tin oxide films deposited by ozone assisted thermal CVD

J. W. Bae; G. Y. Yeom; S. W. Lee; K. H. Song; J. I. Park; K. J. Park

doi:10.1109/IMNC.1998.730060

Tin oxide films deposited by ozone assisted thermal CVD

J. W. Bae
, G. Y. Yeom
, S. W. Lee
, K. H. Song
, J. I. Park
, K. J. Park

Department of Advanced Materials Science and Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Original language	English
Title of host publication	Digest of Papers - Microprocesses and Nanotechnology 1998
Subtitle of host publication	1998 International Microprocesses and Nanotechnology Conference
Editors	Hyung Joon Yoo, Shinji Okazaki, Jinho Ahn, Ohyun Kim, Masanori Komuro
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	237-239
Number of pages	3
ISBN (Electronic)	4930813832, 9784930813831
DOIs	https://doi.org/10.1109/IMNC.1998.730060
State	Published - 1998
Event	1998 International Microprocesses and Nanotechnology Conference, MNC 1998 - Kyoungju, Korea, Republic of Duration: 13 Jul 1998 → 16 Jul 1998

Publication series

Name	Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference
Volume	1998-July

Conference

Conference	1998 International Microprocesses and Nanotechnology Conference, MNC 1998
Country/Territory	Korea, Republic of
City	Kyoungju
Period	13/07/98 → 16/07/98

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10.1109/IMNC.1998.730060

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Bae, J. W., Yeom, G. Y., Lee, S. W., Song, K. H., Park, J. I., & Park, K. J. (1998). Tin oxide films deposited by ozone assisted thermal CVD. In H. J. Yoo, S. Okazaki, J. Ahn, O. Kim, & M. Komuro (Eds.), Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference (pp. 237-239). Article 730060 (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference; Vol. 1998-July). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IMNC.1998.730060

Bae, J. W. ; Yeom, G. Y. ; Lee, S. W. et al. / Tin oxide films deposited by ozone assisted thermal CVD. Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. editor / Hyung Joon Yoo ; Shinji Okazaki ; Jinho Ahn ; Ohyun Kim ; Masanori Komuro. Institute of Electrical and Electronics Engineers Inc., 1998. pp. 237-239 (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference).

@inproceedings{86edef2d8ed548f6bcdc8f632d0b815f,

title = "Tin oxide films deposited by ozone assisted thermal CVD",

author = "Bae, \{J. W.\} and Yeom, \{G. Y.\} and Lee, \{S. W.\} and Song, \{K. H.\} and Park, \{J. I.\} and Park, \{K. J.\}",

year = "1998",

doi = "10.1109/IMNC.1998.730060",

language = "English",

series = "Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

pages = "237--239",

editor = "Yoo, \{Hyung Joon\} and Shinji Okazaki and Jinho Ahn and Ohyun Kim and Masanori Komuro",

booktitle = "Digest of Papers - Microprocesses and Nanotechnology 1998",

note = "1998 International Microprocesses and Nanotechnology Conference, MNC 1998 ; Conference date: 13-07-1998 Through 16-07-1998",

}

Bae, JW, Yeom, GY, Lee, SW, Song, KH, Park, JI & Park, KJ 1998, Tin oxide films deposited by ozone assisted thermal CVD. in HJ Yoo, S Okazaki, J Ahn, O Kim & M Komuro (eds), Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference., 730060, Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference, vol. 1998-July, Institute of Electrical and Electronics Engineers Inc., pp. 237-239, 1998 International Microprocesses and Nanotechnology Conference, MNC 1998, Kyoungju, Korea, Republic of, 13/07/98. https://doi.org/10.1109/IMNC.1998.730060

Tin oxide films deposited by ozone assisted thermal CVD. / Bae, J. W.; Yeom, G. Y.; Lee, S. W. et al.
Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. ed. / Hyung Joon Yoo; Shinji Okazaki; Jinho Ahn; Ohyun Kim; Masanori Komuro. Institute of Electrical and Electronics Engineers Inc., 1998. p. 237-239 730060 (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference; Vol. 1998-July).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Tin oxide films deposited by ozone assisted thermal CVD

AU - Bae, J. W.

AU - Yeom, G. Y.

AU - Lee, S. W.

AU - Song, K. H.

AU - Park, J. I.

AU - Park, K. J.

PY - 1998

Y1 - 1998

UR - https://www.scopus.com/pages/publications/85051437178

U2 - 10.1109/IMNC.1998.730060

DO - 10.1109/IMNC.1998.730060

M3 - Conference contribution

AN - SCOPUS:85051437178

T3 - Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference

SP - 237

EP - 239

BT - Digest of Papers - Microprocesses and Nanotechnology 1998

A2 - Yoo, Hyung Joon

A2 - Okazaki, Shinji

A2 - Ahn, Jinho

A2 - Kim, Ohyun

A2 - Komuro, Masanori

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - 1998 International Microprocesses and Nanotechnology Conference, MNC 1998

Y2 - 13 July 1998 through 16 July 1998

ER -

Bae JW, Yeom GY, Lee SW, Song KH, Park JI, Park KJ. Tin oxide films deposited by ozone assisted thermal CVD. In Yoo HJ, Okazaki S, Ahn J, Kim O, Komuro M, editors, Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. Institute of Electrical and Electronics Engineers Inc. 1998. p. 237-239. 730060. (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference). doi: 10.1109/IMNC.1998.730060

Tin oxide films deposited by ozone assisted thermal CVD

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