Abstract
We have investigated the annealing effect of magnetic tunnel junctions (MTJs) with or without nano-oxide layer (NOL). For MTJ without NOL, TMR ratio increased up to 300°C and the highest value was 21.6%. On the other hand, TMR ratio of MTJ with NOL increased up to 400°C and the highest value was 22.7%. As shown in the auger electron spectroscopy (AES) and transmission electron microscopy (TEM) results, this improved thermal stability is due to NOL in the pinned layer. Mn diffusion into Al-O barrier is blocked and interface of Al-O is smothered by NOL. These may be the main reasons of high thermal stability of MTJ with NOL.
| Original language | English |
|---|---|
| Pages (from-to) | 265-267 |
| Number of pages | 3 |
| Journal | Materials Science and Engineering B |
| Volume | 110 |
| Issue number | 3 |
| DOIs | |
| State | Published - 25 Jul 2004 |
Keywords
- Interface
- Mn diffusion
- NOL
- Thermal stability