Thermally stable MnIr based spin valve type tunnel junction with nano-oxide layer over 400°C

S. Y. Yoon, Y. I. Kim, D. H. Lee, Y. S. Kim, D. H. Yoon, S. J. Suh

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

We have investigated the annealing effect of magnetic tunnel junctions (MTJs) with or without nano-oxide layer (NOL). For MTJ without NOL, TMR ratio increased up to 300°C and the highest value was 21.6%. On the other hand, TMR ratio of MTJ with NOL increased up to 400°C and the highest value was 22.7%. As shown in the auger electron spectroscopy (AES) and transmission electron microscopy (TEM) results, this improved thermal stability is due to NOL in the pinned layer. Mn diffusion into Al-O barrier is blocked and interface of Al-O is smothered by NOL. These may be the main reasons of high thermal stability of MTJ with NOL.

Original languageEnglish
Pages (from-to)265-267
Number of pages3
JournalMaterials Science and Engineering B
Volume110
Issue number3
DOIs
StatePublished - 25 Jul 2004

Keywords

  • Interface
  • Mn diffusion
  • NOL
  • Thermal stability

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