Abstract
This study examined the effects of HT-AlN and LT-GaN buffer layers on the optical properties, crystallinity and morphology of 3D a-plane GaN structures with InGaN/GaN MQWs. The 3D a-plane GaN on the HT-AlN buffer layer showed a rough surface and various facets, whereas the 3D a-plane GaN on the LT-GaN buffer layer contained mainly {1 0 1̄ 1} facets that were tilted 25° to the c-axis giving a pyramidal shape. Narrower full-width at half maximum and higher intensity of the cathodoluminescence spectra of 3D a-plane GaN with InGaN/GaN MQWs were observed with the LT-GaN buffer layer. The monochromatic cathodoluminescence images at a specific wavelength showed that the LT-GaN buffer layer can effectively improve the region of 3D a-plane GaN with InGaN/GaN MQWs.
| Original language | English |
|---|---|
| Pages (from-to) | 174-177 |
| Number of pages | 4 |
| Journal | Journal of Crystal Growth |
| Volume | 315 |
| Issue number | 1 |
| DOIs | |
| State | Published - 15 Jan 2011 |
Keywords
- A3. Metalorganic chemical vapor deposition
- A3. Quantum wells
- A3. Selective epitaxy
- B1. Nitride
- B2. Semiconducting IIIV materials
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