The patterning of sub-500 nm inorganic oxide structures

A study was conducted to investigate patterning of sub-500 nm inorganic oxide structures with perfluoropolyether (PFPE) molds. The study used cross-linked PFPE materials with low surface energy and high gas permeability and aggressive chemistry techniques for the PRINT (Particle Replication in Non-Wetting Templates) process. The sub-500 nm inorganic oxide materials can be used for various application including photovoltaics, super capacitors, biological sensors, electronic devices, and optical devices. The PRINT can provide a new patterning method with uniformity, size control, multilayer deposition, and surface functionalization. The study observed a volume loss on calcination for sol-gel formulations. The development of pattern replication on the sub-100 nm scale for microelectronic applications is under progress.