The patterning of sub-500 nm inorganic oxide structures

Meredith J. Hampton; Stuart S. Williams; Zhilian Zhou; Janine Nunes; Doo Hyun Ko; Joseph L. Templeton; Edward T. Samulski; Joseph M. DeSimone

doi:10.1002/adma.200702495

The patterning of sub-500 nm inorganic oxide structures

Meredith J. Hampton, Stuart S. Williams, Zhilian Zhou, Janine Nunes, Doo Hyun Ko, Joseph L. Templeton, Edward T. Samulski, Joseph M. DeSimone

Research output: Contribution to journal › Article › peer-review

94 Scopus citations

Abstract

A study was conducted to investigate patterning of sub-500 nm inorganic oxide structures with perfluoropolyether (PFPE) molds. The study used cross-linked PFPE materials with low surface energy and high gas permeability and aggressive chemistry techniques for the PRINT (Particle Replication in Non-Wetting Templates) process. The sub-500 nm inorganic oxide materials can be used for various application including photovoltaics, super capacitors, biological sensors, electronic devices, and optical devices. The PRINT can provide a new patterning method with uniformity, size control, multilayer deposition, and surface functionalization. The study observed a volume loss on calcination for sol-gel formulations. The development of pattern replication on the sub-100 nm scale for microelectronic applications is under progress.

Original language	English
Pages (from-to)	2667-2673
Number of pages	7
Journal	Advanced Materials
Volume	20
Issue number	14
DOIs	https://doi.org/10.1002/adma.200702495
State	Published - 17 Jul 2008
Externally published	Yes

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abstract = "A study was conducted to investigate patterning of sub-500 nm inorganic oxide structures with perfluoropolyether (PFPE) molds. The study used cross-linked PFPE materials with low surface energy and high gas permeability and aggressive chemistry techniques for the PRINT (Particle Replication in Non-Wetting Templates) process. The sub-500 nm inorganic oxide materials can be used for various application including photovoltaics, super capacitors, biological sensors, electronic devices, and optical devices. The PRINT can provide a new patterning method with uniformity, size control, multilayer deposition, and surface functionalization. The study observed a volume loss on calcination for sol-gel formulations. The development of pattern replication on the sub-100 nm scale for microelectronic applications is under progress.",

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T1 - The patterning of sub-500 nm inorganic oxide structures

AU - Hampton, Meredith J.

AU - Williams, Stuart S.

AU - Zhou, Zhilian

AU - Nunes, Janine

AU - Ko, Doo Hyun

AU - Templeton, Joseph L.

AU - Samulski, Edward T.

AU - DeSimone, Joseph M.

PY - 2008/7/17

Y1 - 2008/7/17

N2 - A study was conducted to investigate patterning of sub-500 nm inorganic oxide structures with perfluoropolyether (PFPE) molds. The study used cross-linked PFPE materials with low surface energy and high gas permeability and aggressive chemistry techniques for the PRINT (Particle Replication in Non-Wetting Templates) process. The sub-500 nm inorganic oxide materials can be used for various application including photovoltaics, super capacitors, biological sensors, electronic devices, and optical devices. The PRINT can provide a new patterning method with uniformity, size control, multilayer deposition, and surface functionalization. The study observed a volume loss on calcination for sol-gel formulations. The development of pattern replication on the sub-100 nm scale for microelectronic applications is under progress.

AB - A study was conducted to investigate patterning of sub-500 nm inorganic oxide structures with perfluoropolyether (PFPE) molds. The study used cross-linked PFPE materials with low surface energy and high gas permeability and aggressive chemistry techniques for the PRINT (Particle Replication in Non-Wetting Templates) process. The sub-500 nm inorganic oxide materials can be used for various application including photovoltaics, super capacitors, biological sensors, electronic devices, and optical devices. The PRINT can provide a new patterning method with uniformity, size control, multilayer deposition, and surface functionalization. The study observed a volume loss on calcination for sol-gel formulations. The development of pattern replication on the sub-100 nm scale for microelectronic applications is under progress.

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The patterning of sub-500 nm inorganic oxide structures

Abstract

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