The patterning of sub-500 nm inorganic oxide and semiconducting polymeric structures

Meredith J. Hampton; Stuart S. Williams; Zhilian Zhou; Janine Nunes; Doo Hyun Ko; Joseph L. Templeton; Joseph M. DeSimone; Edward T. Samulski

doi:10.1117/12.794890

The patterning of sub-500 nm inorganic oxide and semiconducting polymeric structures

Meredith J. Hampton
, Stuart S. Williams
, Zhilian Zhou
, Janine Nunes
, Doo Hyun Ko
, Joseph L. Templeton
, Joseph M. DeSimone
, Edward T. Samulski

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

2 Scopus citations

Abstract

The Pattern Replication In Non-wetting Templates (PRINT) technique has been extended to patterning of isolated features as well as embossed films of sub-500 nm "hard" inorganic oxides and nanocrystalline semiconductors and "soft" semiconducting polymers including TiO₂, SnO ₂, ZnO, ITO, BaTiO₃, CdSe, poly(3-hexylthiophene) (P3HT), Poly[2-methoxy-5-(3′,7′-dimethyloctyloxy)-1,4-phenylenevinylene] (MDMO-PPV), and other polythiophene derivatives. The low surface energy, chemically resistant, air permeable elastomeric perflouropolyether (PFPE) based molds allow for numerous materials to be patterned on a variety of substrates including glass, transparent conductive oxides, and thin films of conducting polymer for a wide range of electronic and optical applications. Additionally, PRINT has been employed to pattern features with aspect ratios greater than 1, deposit a second layer of features on top of an initial layer without pattern destruction, and replicate sub-100 nm sized features for photovoltaics applications. Materials and patterns generated in this work were characterized using a variety of techniques including: Scanning Electron Microscopy (SEM), Transmission Electron Microscopy (TEM), and X-ray Diffraction (XRD).

Original language	English
Title of host publication	Nanoscale Photonic and Cell Technologies for Photovoltaics
DOIs	https://doi.org/10.1117/12.794890
State	Published - 2008
Externally published	Yes
Event	Nanoscale Photonic and Cell Technologies for Photovoltaics - San Diego, CA, United States Duration: 11 Aug 2008 → 13 Aug 2008

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	7047
ISSN (Print)	0277-786X

Conference

Conference	Nanoscale Photonic and Cell Technologies for Photovoltaics
Country/Territory	United States
City	San Diego, CA
Period	11/08/08 → 13/08/08

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 7 Affordable and Clean Energy

Keywords

Conjugated polymer
Inorganic oxide
Perfluoropolyether
Photovoltaics
Soft lithography

Access to Document

10.1117/12.794890

Cite this

Hampton, M. J., Williams, S. S., Zhou, Z., Nunes, J., Ko, D. H., Templeton, J. L., DeSimone, J. M., & Samulski, E. T. (2008). The patterning of sub-500 nm inorganic oxide and semiconducting polymeric structures. In Nanoscale Photonic and Cell Technologies for Photovoltaics Article 70470T (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7047). https://doi.org/10.1117/12.794890

@inproceedings{982b6f3006104bce9a2f19edf9a7625d,

title = "The patterning of sub-500 nm inorganic oxide and semiconducting polymeric structures",

abstract = "The Pattern Replication In Non-wetting Templates (PRINT) technique has been extended to patterning of isolated features as well as embossed films of sub-500 nm {"}hard{"} inorganic oxides and nanocrystalline semiconductors and {"}soft{"} semiconducting polymers including TiO2, SnO 2, ZnO, ITO, BaTiO3, CdSe, poly(3-hexylthiophene) (P3HT), Poly[2-methoxy-5-(3′,7′-dimethyloctyloxy)-1,4-phenylenevinylene] (MDMO-PPV), and other polythiophene derivatives. The low surface energy, chemically resistant, air permeable elastomeric perflouropolyether (PFPE) based molds allow for numerous materials to be patterned on a variety of substrates including glass, transparent conductive oxides, and thin films of conducting polymer for a wide range of electronic and optical applications. Additionally, PRINT has been employed to pattern features with aspect ratios greater than 1, deposit a second layer of features on top of an initial layer without pattern destruction, and replicate sub-100 nm sized features for photovoltaics applications. Materials and patterns generated in this work were characterized using a variety of techniques including: Scanning Electron Microscopy (SEM), Transmission Electron Microscopy (TEM), and X-ray Diffraction (XRD).",

keywords = "Conjugated polymer, Inorganic oxide, Perfluoropolyether, Photovoltaics, Soft lithography",

author = "Hampton, \{Meredith J.\} and Williams, \{Stuart S.\} and Zhilian Zhou and Janine Nunes and Ko, \{Doo Hyun\} and Templeton, \{Joseph L.\} and DeSimone, \{Joseph M.\} and Samulski, \{Edward T.\}",

year = "2008",

doi = "10.1117/12.794890",

language = "English",

isbn = "9780819472670",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

booktitle = "Nanoscale Photonic and Cell Technologies for Photovoltaics",

note = "Nanoscale Photonic and Cell Technologies for Photovoltaics ; Conference date: 11-08-2008 Through 13-08-2008",

}

Hampton, MJ, Williams, SS, Zhou, Z, Nunes, J, Ko, DH, Templeton, JL, DeSimone, JM & Samulski, ET 2008, The patterning of sub-500 nm inorganic oxide and semiconducting polymeric structures. in Nanoscale Photonic and Cell Technologies for Photovoltaics., 70470T, Proceedings of SPIE - The International Society for Optical Engineering, vol. 7047, Nanoscale Photonic and Cell Technologies for Photovoltaics, San Diego, CA, United States, 11/08/08. https://doi.org/10.1117/12.794890

The patterning of sub-500 nm inorganic oxide and semiconducting polymeric structures. / Hampton, Meredith J.; Williams, Stuart S.; Zhou, Zhilian et al.
Nanoscale Photonic and Cell Technologies for Photovoltaics. 2008. 70470T (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7047).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - The patterning of sub-500 nm inorganic oxide and semiconducting polymeric structures

AU - Hampton, Meredith J.

AU - Williams, Stuart S.

AU - Zhou, Zhilian

AU - Nunes, Janine

AU - Ko, Doo Hyun

AU - Templeton, Joseph L.

AU - DeSimone, Joseph M.

AU - Samulski, Edward T.

PY - 2008

Y1 - 2008

N2 - The Pattern Replication In Non-wetting Templates (PRINT) technique has been extended to patterning of isolated features as well as embossed films of sub-500 nm "hard" inorganic oxides and nanocrystalline semiconductors and "soft" semiconducting polymers including TiO2, SnO 2, ZnO, ITO, BaTiO3, CdSe, poly(3-hexylthiophene) (P3HT), Poly[2-methoxy-5-(3′,7′-dimethyloctyloxy)-1,4-phenylenevinylene] (MDMO-PPV), and other polythiophene derivatives. The low surface energy, chemically resistant, air permeable elastomeric perflouropolyether (PFPE) based molds allow for numerous materials to be patterned on a variety of substrates including glass, transparent conductive oxides, and thin films of conducting polymer for a wide range of electronic and optical applications. Additionally, PRINT has been employed to pattern features with aspect ratios greater than 1, deposit a second layer of features on top of an initial layer without pattern destruction, and replicate sub-100 nm sized features for photovoltaics applications. Materials and patterns generated in this work were characterized using a variety of techniques including: Scanning Electron Microscopy (SEM), Transmission Electron Microscopy (TEM), and X-ray Diffraction (XRD).

AB - The Pattern Replication In Non-wetting Templates (PRINT) technique has been extended to patterning of isolated features as well as embossed films of sub-500 nm "hard" inorganic oxides and nanocrystalline semiconductors and "soft" semiconducting polymers including TiO2, SnO 2, ZnO, ITO, BaTiO3, CdSe, poly(3-hexylthiophene) (P3HT), Poly[2-methoxy-5-(3′,7′-dimethyloctyloxy)-1,4-phenylenevinylene] (MDMO-PPV), and other polythiophene derivatives. The low surface energy, chemically resistant, air permeable elastomeric perflouropolyether (PFPE) based molds allow for numerous materials to be patterned on a variety of substrates including glass, transparent conductive oxides, and thin films of conducting polymer for a wide range of electronic and optical applications. Additionally, PRINT has been employed to pattern features with aspect ratios greater than 1, deposit a second layer of features on top of an initial layer without pattern destruction, and replicate sub-100 nm sized features for photovoltaics applications. Materials and patterns generated in this work were characterized using a variety of techniques including: Scanning Electron Microscopy (SEM), Transmission Electron Microscopy (TEM), and X-ray Diffraction (XRD).

KW - Conjugated polymer

KW - Inorganic oxide

KW - Perfluoropolyether

KW - Photovoltaics

KW - Soft lithography

UR - https://www.scopus.com/pages/publications/56249109427

U2 - 10.1117/12.794890

DO - 10.1117/12.794890

M3 - Conference contribution

AN - SCOPUS:56249109427

SN - 9780819472670

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - Nanoscale Photonic and Cell Technologies for Photovoltaics

T2 - Nanoscale Photonic and Cell Technologies for Photovoltaics

Y2 - 11 August 2008 through 13 August 2008

ER -

The patterning of sub-500 nm inorganic oxide and semiconducting polymeric structures

Abstract

Publication series

Conference

UN SDGs

Keywords

Access to Document

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Cite this