The mechanical effect of soft pad on copper chemical mechanical polishing
- Pengzhan Liu
- , Yuna Nam
- , Seunghwan Lee
- , Eungchul Kim
- , Sanghuck Jeon
- , Kihong Park
- , Seokjun Hong
- , Taesung Kim
- Sungkyunkwan University
- Samsung
Research output: Contribution to journal › Article › peer-review
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