The effects of CF4 plasma treatment on the performance, gate bias stability, and defect characteristics of low-temperature indium-gallium-tin-oxide thin-film transistors
- Dongbhin Kim
- , Kyeong Bae Lee
- , Junho Noh
- , Donghyun Kim
- , Hyunsoo Park
- , Byoungdeog Choi
- Sungkyunkwan University
Research output: Contribution to journal › Article › peer-review
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