The effect of substrate temperature on Al-doped ZnO characteristics for organic thin film transistor applications

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Abstract

The influence of substrate temperature on the structural, electrical, and optical properties of aluminum-doped zinc oxide (AZO) films fabricated by radio frequency (RF) magnetron sputtering was investigated. The AZO films were deposited at various substrate temperatures, and the effect of AZO gate electrode conductivity on organic thin film transistor (OTFT) performance was examined. While an increase in the substrate temperature from 100 °C to 300 °C led to an improvement in crystallinity, substrate temperatures over 300 °C caused degradation of the electrical and surface properties. We fabricated OTFTs using AZO films prepared at various substrate temperatures and obtained good device performance. Thus, the performance of an OTFT can be determined by the conductivity of the AZO gate electrode.

Original languageEnglish
Pages (from-to)5136-5140
Number of pages5
JournalMaterials Research Bulletin
Volume48
Issue number12
DOIs
StatePublished - 2013

Keywords

  • A. Oxides
  • A. Thin films
  • B. Optical properties
  • B. Sputtering
  • D. Electrical properties

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