The effect of film thickness on critical properties of YBCO film fabricated by TFA-MOD using 211-process

J. H. Lim, S. H. Jang, K. T. Kim, S. M. Hwang, J. Joo, H. J. Lee, H. G. Lee, G. W. Hong

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

YBCO films were fabricated by the TFA-MOD method using the "211-process", and the effects of the film thickness on phase formation, microstructure, texture evolution, and critical properties were evaluated. Various film thicknesses ranging from 0.41 μm to 2.14 μm were obtained by repeating the dip coating and calcining processes one to five times. The critical properties varied significantly with the film thickness. The Ic increased from 35 to 105 A/cm-width with increasing the film thickness from 0.41 μm to 1.17 μm. On the other hand, the corresponding Jc remained almost constant in the range of 0.76-0.90 MA/cm2. With further increases in thickness, these values decreased drastically, which was attributed to the degraded microstructure, i.e., the formation of BaF2 and a-axis grains and degraded texture and surface morphology arising from the insufficient heat treatment time. It is believed that the optimum thickness for improving both the Ic and Jc values is approximately 1.17 μm.

Original languageEnglish
Pages (from-to)532-535
Number of pages4
JournalPhysica C: Superconductivity and its Applications
Volume463-465
Issue numberSUPPL.
DOIs
StatePublished - 1 Oct 2007

Keywords

  • 211-process
  • Critical current
  • Metal-organic deposition
  • Pole figure
  • YBCO coated conductor

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