Synthesis and optimization of porous anodic aluminum oxide nano-template for large area device applications

Younghee Na; Umme Farva; Sung Min Cho; Chinho Park

doi:10.1007/s11814-009-0336-y

Synthesis and optimization of porous anodic aluminum oxide nano-template for large area device applications

Younghee Na
, Umme Farva
, Sung Min Cho
, Chinho Park

Department of Chemical Engineering

Research output: Contribution to journal › Article › peer-review

4 Scopus citations

Abstract

A simplified anodized aluminum oxide (AAO) nano-template fabrication process was developed in this study, which can be suited for the large area device applications. The pores of various sizes and depths were realized from the thin (less than 1 μm) aluminum film deposited on the sapphire substrate. The optimum morphological structure was obtained by adjusting the applied voltage, types of acid solution, its concentration and temperature which has evolved after two phases of anodization followed by chemical etching. The Ar plasma pre-treatment method was developed and applied to improve the surface roughness of thin aluminum film without severely sacrificing the deposited layer thickness.

Original language	English
Pages (from-to)	1785-1789
Number of pages	5
Journal	Korean Journal of Chemical Engineering
Volume	26
Issue number	6
DOIs	https://doi.org/10.1007/s11814-009-0336-y
State	Published - Nov 2009

Keywords

Anodized Aluminum Oxide
Nano-Template
Plasma Treatment

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10.1007/s11814-009-0336-y

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title = "Synthesis and optimization of porous anodic aluminum oxide nano-template for large area device applications",

abstract = "A simplified anodized aluminum oxide (AAO) nano-template fabrication process was developed in this study, which can be suited for the large area device applications. The pores of various sizes and depths were realized from the thin (less than 1 μm) aluminum film deposited on the sapphire substrate. The optimum morphological structure was obtained by adjusting the applied voltage, types of acid solution, its concentration and temperature which has evolved after two phases of anodization followed by chemical etching. The Ar plasma pre-treatment method was developed and applied to improve the surface roughness of thin aluminum film without severely sacrificing the deposited layer thickness.",

keywords = "Anodized Aluminum Oxide, Nano-Template, Plasma Treatment",

author = "Younghee Na and Umme Farva and Cho, \{Sung Min\} and Chinho Park",

year = "2009",

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doi = "10.1007/s11814-009-0336-y",

language = "English",

volume = "26",

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journal = "Korean Journal of Chemical Engineering",

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T1 - Synthesis and optimization of porous anodic aluminum oxide nano-template for large area device applications

AU - Na, Younghee

AU - Farva, Umme

AU - Cho, Sung Min

AU - Park, Chinho

PY - 2009/11

Y1 - 2009/11

N2 - A simplified anodized aluminum oxide (AAO) nano-template fabrication process was developed in this study, which can be suited for the large area device applications. The pores of various sizes and depths were realized from the thin (less than 1 μm) aluminum film deposited on the sapphire substrate. The optimum morphological structure was obtained by adjusting the applied voltage, types of acid solution, its concentration and temperature which has evolved after two phases of anodization followed by chemical etching. The Ar plasma pre-treatment method was developed and applied to improve the surface roughness of thin aluminum film without severely sacrificing the deposited layer thickness.

AB - A simplified anodized aluminum oxide (AAO) nano-template fabrication process was developed in this study, which can be suited for the large area device applications. The pores of various sizes and depths were realized from the thin (less than 1 μm) aluminum film deposited on the sapphire substrate. The optimum morphological structure was obtained by adjusting the applied voltage, types of acid solution, its concentration and temperature which has evolved after two phases of anodization followed by chemical etching. The Ar plasma pre-treatment method was developed and applied to improve the surface roughness of thin aluminum film without severely sacrificing the deposited layer thickness.

KW - Anodized Aluminum Oxide

KW - Nano-Template

KW - Plasma Treatment

UR - https://www.scopus.com/pages/publications/77951542272

U2 - 10.1007/s11814-009-0336-y

DO - 10.1007/s11814-009-0336-y

M3 - Article

AN - SCOPUS:77951542272

SN - 0256-1115

VL - 26

SP - 1785

EP - 1789

JO - Korean Journal of Chemical Engineering

JF - Korean Journal of Chemical Engineering

IS - 6

ER -

Synthesis and optimization of porous anodic aluminum oxide nano-template for large area device applications

Abstract

Keywords

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