Surface cleaning of graphene by CO2 cluster

Hoo Mi Choi; Jang Ah Kim; Yu Jin Cho; Taeh Yun Hwang; Jon Woo Lee; Tae Sung Kim

doi:10.4028/www.scientific.net/SSP.219.68

Surface cleaning of graphene by CO₂ cluster

Hoo Mi Choi
, Jang Ah Kim
, Yu Jin Cho
, Taeh Yun Hwang
, Jon Woo Lee
, Tae Sung Kim

Department of Mechanical Engineering

Samsung
Sungkyunkwan University

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

2 Scopus citations

Original language	English
Title of host publication	Ultra Clean Processing of Semiconductor Surfaces XII
Editors	Paul W. Mertens, Marc Meuris, Marc Heyns, Marc Meuris, Marc Heyns
Publisher	Trans Tech Publications Ltd
Pages	68-70
Number of pages	3
ISBN (Electronic)	9783038352426
DOIs	https://doi.org/10.4028/www.scientific.net/SSP.219.68
State	Published - 2015
Event	12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2014 - Brussels, Belgium Duration: 21 Sep 2014 → 24 Sep 2014

Publication series

Name	Solid State Phenomena
Volume	219
ISSN (Print)	1012-0394
ISSN (Electronic)	1662-9779

Conference

Conference	12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2014
Country/Territory	Belgium
City	Brussels
Period	21/09/14 → 24/09/14

Keywords

Cleaning
CO cluster
Graphene
Residue
Surface treatment

Access to Document

10.4028/www.scientific.net/SSP.219.68

Cite this

Choi, H. M., Kim, J. A., Cho, Y. J., Hwang, T. Y., Lee, J. W., & Kim, T. S. (2015). Surface cleaning of graphene by CO₂ cluster. In P. W. Mertens, M. Meuris, M. Heyns, M. Meuris, & M. Heyns (Eds.), Ultra Clean Processing of Semiconductor Surfaces XII (pp. 68-70). (Solid State Phenomena; Vol. 219). Trans Tech Publications Ltd. https://doi.org/10.4028/www.scientific.net/SSP.219.68

@inproceedings{d6d19f7eb06e4395a2e09ca85f9f341d,

title = "Surface cleaning of graphene by CO2 cluster",

keywords = "Cleaning, CO cluster, Graphene, Residue, Surface treatment",

author = "Choi, \{Hoo Mi\} and Kim, \{Jang Ah\} and Cho, \{Yu Jin\} and Hwang, \{Taeh Yun\} and Lee, \{Jon Woo\} and Kim, \{Tae Sung\}",

year = "2015",

doi = "10.4028/www.scientific.net/SSP.219.68",

language = "English",

series = "Solid State Phenomena",

publisher = "Trans Tech Publications Ltd",

pages = "68--70",

editor = "Mertens, \{Paul W.\} and Marc Meuris and Marc Heyns and Marc Meuris and Marc Heyns",

booktitle = "Ultra Clean Processing of Semiconductor Surfaces XII",

note = "12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2014 ; Conference date: 21-09-2014 Through 24-09-2014",

}

Choi, HM, Kim, JA, Cho, YJ, Hwang, TY, Lee, JW & Kim, TS 2015, Surface cleaning of graphene by CO₂ cluster. in PW Mertens, M Meuris, M Heyns, M Meuris & M Heyns (eds), Ultra Clean Processing of Semiconductor Surfaces XII. Solid State Phenomena, vol. 219, Trans Tech Publications Ltd, pp. 68-70, 12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2014, Brussels, Belgium, 21/09/14. https://doi.org/10.4028/www.scientific.net/SSP.219.68

Surface cleaning of graphene by CO₂ cluster. / Choi, Hoo Mi; Kim, Jang Ah; Cho, Yu Jin et al.
Ultra Clean Processing of Semiconductor Surfaces XII. ed. / Paul W. Mertens; Marc Meuris; Marc Heyns; Marc Meuris; Marc Heyns. Trans Tech Publications Ltd, 2015. p. 68-70 (Solid State Phenomena; Vol. 219).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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AU - Cho, Yu Jin

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AU - Lee, Jon Woo

AU - Kim, Tae Sung

PY - 2015

Y1 - 2015

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KW - Graphene

KW - Residue

KW - Surface treatment

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BT - Ultra Clean Processing of Semiconductor Surfaces XII

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