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Study on the characteristics of toluene-tetraethoxysilane hybrid plasma-polymer thin films
S. J. Cho
, I. S. Bae
, S. Lee
, D. Jung
, W. S. Choi
,
J. H. Boo
Department of Chemistry
Sungkyunkwan University
Hanbat National University
Research output
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Contribution to journal
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Article
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peer-review
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Material Science
Thin Films
100%
Tetraethyl Orthosilicate
100%
Current-Voltage Characteristic
40%
Capacitance
40%
Permittivity
40%
Atomic Force Microscopy
40%
Density
20%
Surface Roughness
20%
Film
20%
Silicon
20%
Plasma-Enhanced Chemical Vapor Deposition
20%
Nanoindentation
20%
Fourier Transform Infrared Spectroscopy
20%
Young's Modulus
20%
Engineering
Thin Films
100%
Plasma Polymer
100%
Current-Voltage Characteristic
50%
Dielectrics
50%
Atomic Force Microscopy
50%
Radio Frequency
25%
Chemical Vapor Deposition
25%
Vapor Deposition
25%
Deposition System
25%
Young's Modulus
25%
FTIR Spectroscopy
25%
Chemical Engineering
Film
100%
Plasma Enhanced Chemical Vapor Deposition
20%