Skip to main navigation Skip to search Skip to main content

Study of GaN etch mechanisms using inductively coupled Cl2/Ar plasmas

  • Sungkyunkwan University
  • Samsung

Research output: Contribution to journal › Conference article › peer-review

59   Link opens in a new tab Scopus citations

Fingerprint

Dive into the research topics of 'Study of GaN etch mechanisms using inductively coupled Cl2/Ar plasmas'. Together they form a unique fingerprint.
Sort by

Material Science

Engineering

Physics