TY - JOUR
T1 - Stochastic behavior of random telegraph noise in ferroelectric devices
T2 - Impact of downscaling and mitigation strategies for neuromorphic applications
AU - Koo, Ryun Han
AU - Shin, Wonjun
AU - Lee, Sung Tae
AU - Kwon, Daewoong
AU - Lee, Jong Ho
N1 - Publisher Copyright:
© 2024 Elsevier Ltd
PY - 2025/2
Y1 - 2025/2
N2 - This study investigates the stochastic behavior of random telegraph noise (RTN) in ferroelectric tunnel junctions (FTJs) considering the downscaling effect and its implications for neuromorphic systems. Through low-frequency noise spectroscopy and DC current fluctuation measurements of fabricated FTJs with varying top electrode areas, we quantified the stochasticity of the tunneling current as a function of applied voltage and device area. Our results indicate a significant increase in RTN-related stochasticity with decreasing FTJ area, resulting in higher RTN amplitude and a greater number of devices exhibiting RTN. Analysis of the capture and emission time constants of RTN shows that RTN arises from the interaction between the metal top electrode and a dominant trap site, located 4 nm deep from the top electrode, with a trap energy 1.8 eV below the conduction band of the HZO layer. To assess the impact on neuromorphic systems, we performed system-level simulations incorporating the measured device non-idealities (nonlinearity, limited dynamic range) and stochasticity (1/f noise and RTN), and demonstrated that RTN can severely degrade system accuracy as device size decreases. To mitigate this problem, we proposed a limited dynamic range scheme that confines device operation to RTN-safe conductance levels, effectively minimizing accuracy degradation. This study clarifies the origin of the stochastic behavior of RTN in FTJs and also provides system-level solutions for high-density neuromorphic hardware systems affected by RTN.
AB - This study investigates the stochastic behavior of random telegraph noise (RTN) in ferroelectric tunnel junctions (FTJs) considering the downscaling effect and its implications for neuromorphic systems. Through low-frequency noise spectroscopy and DC current fluctuation measurements of fabricated FTJs with varying top electrode areas, we quantified the stochasticity of the tunneling current as a function of applied voltage and device area. Our results indicate a significant increase in RTN-related stochasticity with decreasing FTJ area, resulting in higher RTN amplitude and a greater number of devices exhibiting RTN. Analysis of the capture and emission time constants of RTN shows that RTN arises from the interaction between the metal top electrode and a dominant trap site, located 4 nm deep from the top electrode, with a trap energy 1.8 eV below the conduction band of the HZO layer. To assess the impact on neuromorphic systems, we performed system-level simulations incorporating the measured device non-idealities (nonlinearity, limited dynamic range) and stochasticity (1/f noise and RTN), and demonstrated that RTN can severely degrade system accuracy as device size decreases. To mitigate this problem, we proposed a limited dynamic range scheme that confines device operation to RTN-safe conductance levels, effectively minimizing accuracy degradation. This study clarifies the origin of the stochastic behavior of RTN in FTJs and also provides system-level solutions for high-density neuromorphic hardware systems affected by RTN.
KW - Current fluctuation
KW - Ferroelectric tunnel junction (FTJ)
KW - Lorentzian noise
KW - Low-frequency noise (LFN)
KW - Neuromorphic system
KW - Random telegraph noise (RTN)
KW - Stochastic read noise
UR - https://www.scopus.com/pages/publications/85210917434
U2 - 10.1016/j.chaos.2024.115856
DO - 10.1016/j.chaos.2024.115856
M3 - Article
AN - SCOPUS:85210917434
SN - 0960-0779
VL - 191
JO - Chaos, Solitons and Fractals
JF - Chaos, Solitons and Fractals
M1 - 115856
ER -