Solvent Engineering of Colloidal Quantum Dot Inks for Scalable Fabrication of Photovoltaics

  • Jonghee Yang
  • , Minseon Kim
  • , Seungjin Lee
  • , Jung Won Yoon
  • , Sanchari Shome
  • , Koen Bertens
  • , Hochan Song
  • , Seul Gi Lim
  • , Jae Taek Oh
  • , Sung Yong Bae
  • , Bo Ram Lee
  • , Whikun Yi
  • , Edward H. Sargent
  • , Hyosung Choi

Research output: Contribution to journalArticlepeer-review

30 Scopus citations

Abstract

Development of colloidal quantum dot (CQD) inks enables single-step spin-coating of compact CQD films of appropriate thickness, enabling the promising performance of CQD photovoltaics (CQDPVs). Today's highest-performing CQD inks rely on volatile n-butylamine (BTA), but it is incompatible with scalable deposition methods since a rapid solvent evaporation results in irregular film thickness with an uneven surface. Here, we present a hybrid solvent system, consisting of BTA and N,N-dimethylformamide, which has a favorable acidity for colloidal stability as well as an appropriate vapor pressure, enabling a stable CQD ink that can be used to fabricate homogeneous, large-area CQD films via spray-coating. CQDPVs fabricated with the CQD ink exhibit suppressed charge recombination as well as fast charge extraction compared with conventional CQD ink-based PVs, achieving an improved power conversion efficiency (PCE) of 12.22% in spin-coated devices and the highest ever reported PCE of 8.84% among spray-coated CQDPVs.

Original languageEnglish
Pages (from-to)36992-37003
Number of pages12
JournalACS Applied Materials and Interfaces
Volume13
Issue number31
DOIs
StatePublished - 11 Aug 2021
Externally publishedYes

Keywords

  • colloidal quantum dot
  • large-area photovoltaics
  • Lewis acid
  • Lewis base
  • solvent engineering
  • spray-coating

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