Abstract
We describe approaches taken to address the challenges in making useful and reproducible single-walled carbon nanotube field effect transistors. Both Al2O3 and HfO2 dielectrics for gate insulation have been discussed as are techniques for aligning carbon nanotubes. A variety of measurements, including transistor output characteristics, transfer characteristics and low frequency noise measurements have been described to assess the properties of these devices.
| Original language | English |
|---|---|
| Title of host publication | Nanostructures in Electronics and Photonics |
| Publisher | Pan Stanford Publishing Pte. Ltd. |
| Pages | 63-82 |
| Number of pages | 20 |
| ISBN (Print) | 9789814241106 |
| DOIs | |
| State | Published - 1 Apr 2008 |
| Externally published | Yes |