Signal Integrity Enhancement of Die-to-Die Interconnection by Using a Vertically Asymmetric Pattern

Jaewon Lee, Kihun Ok, So Young Kim

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Enhancing signal integrity (SI) in high-speed die-to-die interconnections is crucial to ensure stable and reliable system performance. Interconnection structures influence insertion loss (IL) and crosstalk performance, and the structural optimization is essential in improving SI. To address these challenges, this study proposes a vertically asymmetric pattern for die-to-die interconnections. The proposed design repositions the traces to mitigate SI degradation. Frequency domain analysis using Ansys HFSS demonstrates a significant improvement in IL, meanwhile time domain analysis shows a 36. 8% improvement in the worst-case eye diagram Rx mask width. These findings validate the effectiveness of the proposed design in improving SI and advancing the development of high-speed die-to-die interconnections.

Original languageEnglish
Title of host publication2025 International Conference on Electronics Packaging and iMAPS All Asia Conference, ICEP-IAAC 2025
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages277-278
Number of pages2
ISBN (Electronic)9784991191190
DOIs
StatePublished - 2025
Event24th International Conference on Electronics Packaging and iMAPS All Asia Conference, ICEP-IAAC 2025 - Nagano, Japan
Duration: 15 Apr 202519 Apr 2025

Publication series

Name2025 International Conference on Electronics Packaging and iMAPS All Asia Conference, ICEP-IAAC 2025

Conference

Conference24th International Conference on Electronics Packaging and iMAPS All Asia Conference, ICEP-IAAC 2025
Country/TerritoryJapan
CityNagano
Period15/04/2519/04/25

Keywords

  • Die-to-die interconnection
  • eye diagram
  • far end crosstalk
  • insertion loss
  • signal integrity

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