Sensitivity enhancement of dielectric plasma etching endpoint detection by optical emission spectra with modified k-means cluster analysis
- Haegyu Jang
- , Hakseung Lee
- , Honyoung Lee
- , Chang Koo Kim
- , Heeyeop Chae
- Sungkyunkwan University
- Samsung
- Ajou University
Research output: Contribution to journal › Article › peer-review
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