Self-controlled growth of silica thin films for nanopatterning

Gyoujin Cho; Jongkwan Jang; Sunggi Jung; Il Shik Moon; Jae Suk Lee; Young Sun Cho; Bing M. Fung; Wei Li Yuan; Edgar A. O'Rear

doi:10.1021/la015688n

Self-controlled growth of silica thin films for nanopatterning

Gyoujin Cho
, Jongkwan Jang
, Sunggi Jung
, Il Shik Moon
, Jae Suk Lee
, Young Sun Cho
, Bing M. Fung
, Wei Li Yuan
, Edgar A. O'Rear

Sunchon National University
Gwangju Institute of Science and Technology
University of Oklahoma

Research output: Contribution to journal › Article › peer-review

25 Scopus citations

Abstract

A method to control both the nucleation and growth of SiO₂ to form nanopatterns width in an oil phase was investigated. The nucleated SiO₂ self-controlled the minimum interfacial energy and was found to grow at a direction normal to the surface. The results showed that the resulting SiO₂ could be grown on protonated poly(styrene-b-4-vinylpyridine) blocks up to a height of 8 nm by 60 nm.

Original language	English
Pages (from-to)	3430-3433
Number of pages	4
Journal	Langmuir
Volume	18
Issue number	9
DOIs	https://doi.org/10.1021/la015688n
State	Published - 30 Apr 2002
Externally published	Yes

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10.1021/la015688n

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title = "Self-controlled growth of silica thin films for nanopatterning",

abstract = "A method to control both the nucleation and growth of SiO2 to form nanopatterns width in an oil phase was investigated. The nucleated SiO2 self-controlled the minimum interfacial energy and was found to grow at a direction normal to the surface. The results showed that the resulting SiO2 could be grown on protonated poly(styrene-b-4-vinylpyridine) blocks up to a height of 8 nm by 60 nm.",

author = "Gyoujin Cho and Jongkwan Jang and Sunggi Jung and Moon, \{Il Shik\} and Lee, \{Jae Suk\} and Cho, \{Young Sun\} and Fung, \{Bing M.\} and Yuan, \{Wei Li\} and O'Rear, \{Edgar A.\}",

year = "2002",

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doi = "10.1021/la015688n",

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TY - JOUR

T1 - Self-controlled growth of silica thin films for nanopatterning

AU - Cho, Gyoujin

AU - Jang, Jongkwan

AU - Jung, Sunggi

AU - Moon, Il Shik

AU - Lee, Jae Suk

AU - Cho, Young Sun

AU - Fung, Bing M.

AU - Yuan, Wei Li

AU - O'Rear, Edgar A.

PY - 2002/4/30

Y1 - 2002/4/30

N2 - A method to control both the nucleation and growth of SiO2 to form nanopatterns width in an oil phase was investigated. The nucleated SiO2 self-controlled the minimum interfacial energy and was found to grow at a direction normal to the surface. The results showed that the resulting SiO2 could be grown on protonated poly(styrene-b-4-vinylpyridine) blocks up to a height of 8 nm by 60 nm.

AB - A method to control both the nucleation and growth of SiO2 to form nanopatterns width in an oil phase was investigated. The nucleated SiO2 self-controlled the minimum interfacial energy and was found to grow at a direction normal to the surface. The results showed that the resulting SiO2 could be grown on protonated poly(styrene-b-4-vinylpyridine) blocks up to a height of 8 nm by 60 nm.

UR - https://www.scopus.com/pages/publications/0037198192

U2 - 10.1021/la015688n

DO - 10.1021/la015688n

M3 - Article

AN - SCOPUS:0037198192

SN - 0743-7463

VL - 18

SP - 3430

EP - 3433

JO - Langmuir

JF - Langmuir

IS - 9

ER -

Self-controlled growth of silica thin films for nanopatterning

Abstract

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