Selective growth of nanometre scale structures with high resolution using thermal energy in AFM lithography

We report the effect of applied thermal energy in the fabrication of protruded nanostructures on tantalum (Ta) thin films using atomic force microscope (AFM) lithography and the fabrication of nanopatterns of Ta thin films by a dry etching process of protruded tantalum oxide (Ta₂O ₅). Oxidized nanostructures with a high aspect ratio were successfully fabricated at high temperature by applying thermal energy. The lithographic speed of fabrication of protruded nanostructures was dramatically improved by the enhancement of electron transfer depending on the applied thermal energy and directional diffusion of OH^- ions depending on the increase of temperature. Nanopatterns of Ta with a high angle slope (over 80°) were fabricated by selective dry etching of Ta₂O ₅.