Abstract
The switching mechanism of the bipolar resistive switching behavior on NiO films was examined using local probe based measurements. Unlike the unipolar switching normally observed on a metal-insulator-metal structure, repetitive bipolar switching was observed on NiO films when a local probe was used as the top electrode. Surface potential and current maps obtained after the anodic/cathodic bias application through the scanning probe both in air and under high vacuum suggested that the resistive switching is caused mainly by the electrochemical redox reaction at the electrode-film interface rather than by charge drift within the NiO film.
| Original language | English |
|---|---|
| Article number | 062909 |
| Journal | Applied Physics Letters |
| Volume | 97 |
| Issue number | 6 |
| DOIs | |
| State | Published - 9 Aug 2010 |
| Externally published | Yes |