Reduction of the electrostatic coupling in a large-area internal inductively coupled plasma source using a multicusp magnetic field

Y. J. Lee; K. N. Kim; G. Y. Yeom; M. A. Lieberman

doi:10.1063/1.1784877

Reduction of the electrostatic coupling in a large-area internal inductively coupled plasma source using a multicusp magnetic field

Y. J. Lee
, K. N. Kim
, G. Y. Yeom
, M. A. Lieberman

Department of Advanced Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

Abstract

The reduction of the capactive coupling between the antenna and the plasma was discussed in a large area internal-type linear-antenna ICP system by applying an asymmetric magnetic field. High plasma densities of up to 10 ¹¹ cm ^-3 and higher photoresist etch rates were noticed in the presence of the magnetic field. The increase in plasma density and decrease in rf antenna voltage were suggested to be due to two factors, including the formation of an E×B field near the antenna and decreased diffusional loss of the plasma to the chamber wall near the antenna. The application of the magnetic field was also found to increase the stability of the plasma.

Original language	English
Pages (from-to)	1677-1679
Number of pages	3
Journal	Applied Physics Letters
Volume	85
Issue number	10
DOIs	https://doi.org/10.1063/1.1784877
State	Published - 6 Sep 2004

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abstract = "The reduction of the capactive coupling between the antenna and the plasma was discussed in a large area internal-type linear-antenna ICP system by applying an asymmetric magnetic field. High plasma densities of up to 10 11 cm -3 and higher photoresist etch rates were noticed in the presence of the magnetic field. The increase in plasma density and decrease in rf antenna voltage were suggested to be due to two factors, including the formation of an E×B field near the antenna and decreased diffusional loss of the plasma to the chamber wall near the antenna. The application of the magnetic field was also found to increase the stability of the plasma.",

author = "Lee, \{Y. J.\} and Kim, \{K. N.\} and Yeom, \{G. Y.\} and Lieberman, \{M. A.\}",

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AU - Lee, Y. J.

AU - Kim, K. N.

AU - Yeom, G. Y.

AU - Lieberman, M. A.

PY - 2004/9/6

Y1 - 2004/9/6

N2 - The reduction of the capactive coupling between the antenna and the plasma was discussed in a large area internal-type linear-antenna ICP system by applying an asymmetric magnetic field. High plasma densities of up to 10 11 cm -3 and higher photoresist etch rates were noticed in the presence of the magnetic field. The increase in plasma density and decrease in rf antenna voltage were suggested to be due to two factors, including the formation of an E×B field near the antenna and decreased diffusional loss of the plasma to the chamber wall near the antenna. The application of the magnetic field was also found to increase the stability of the plasma.

AB - The reduction of the capactive coupling between the antenna and the plasma was discussed in a large area internal-type linear-antenna ICP system by applying an asymmetric magnetic field. High plasma densities of up to 10 11 cm -3 and higher photoresist etch rates were noticed in the presence of the magnetic field. The increase in plasma density and decrease in rf antenna voltage were suggested to be due to two factors, including the formation of an E×B field near the antenna and decreased diffusional loss of the plasma to the chamber wall near the antenna. The application of the magnetic field was also found to increase the stability of the plasma.

UR - https://www.scopus.com/pages/publications/4944235279

U2 - 10.1063/1.1784877

DO - 10.1063/1.1784877

M3 - Article

AN - SCOPUS:4944235279

SN - 0003-6951

VL - 85

SP - 1677

EP - 1679

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 10

ER -

Reduction of the electrostatic coupling in a large-area internal inductively coupled plasma source using a multicusp magnetic field

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