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Realization of vertically well-aligned ZnO:Ga nanorods by magnetron sputtering and their field emission behavior

  • Sungkyunkwan University

Research output: Contribution to journalArticlepeer-review

Abstract

We report catalyst-free growth of one-dimensional Ga-doped ZnO nanorod arrays on (001) Si substrate with a thin buffer layer by magnetron sputtering. The diameter and length of the nanorods are in the range of 90-144 nm and about 1.38 μπι, with an aspect ratio nearly 12:1 and deviation angle ± 6° between the [0001]Zno direction and substrate normal. The photoluminescence spectra of the nanorods are dominated by intense near band-edge emission with weak deep-level emission. The good field emission properties of the nanorod arrays with turn-on field of 2.9 V/μm and enhancement factor of 2027 demonstrate the perfect single-crystalline growth of ZnO:Ga nanorods with similar vertical alignment.

Original languageEnglish
Pages (from-to)1458-1460
Number of pages3
JournalCrystal Growth and Design
Volume8
Issue number5
DOIs
StatePublished - May 2008

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