Real-time observation of Cu electroless deposition: Effect of EDTA on removing of Cu oxide and adsorption of formaldehyde

Taeho Lim, Kyung Ju Park, Myung Jun Kim, Hyo Chol Koo, Kwang Hwan Kim, Seunghoe Choe, Jae Jeong Kim

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

During Cu electroless deposition (Cu ELD), the effect of ethylenediaminetetraacetic acid (EDTA) on the adsorption of formaldehyde on pre-oxidized Cu surface was investigated in real time by open-circuit potential measurement assisted by quartz crystal microbalance. It was found that formaldehyde alone rarely adsorbed on the oxidized Cu surface. However, in the presence of EDTA, the adsorption of formaldehyde occurred as EDTA removed the Cu oxide from the surface. On an oxidized Cu surface, the oxide removal by EDTA occurred predominantly in the initial stages of ELD. Subsequently, deposition began when formaldehyde was able to be adsorbed on the Cu surface. The process was also characterized using sheet resistance measurement and X-ray photoelectron spectroscopy. EDTA facilitated the Cu ELD process even in the presence of Cu oxide at the surface.

Original languageEnglish
Pages (from-to)D3134-D3138
JournalJournal of the Electrochemical Society
Volume160
Issue number12
DOIs
StatePublished - 2013
Externally publishedYes

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