Reactivity and stability of ni nanoparticles supported by mesoporous SiO2 and TiO2/SiO2 for CO2 reforming of CH4

Dae Han Kim; Hyun Ook Seo; Myung Geun Jeong; Young Dok Kim

doi:10.1007/s10562-013-1152-x

Reactivity and stability of ni nanoparticles supported by mesoporous SiO₂ and TiO₂/SiO₂ for CO₂ reforming of CH₄

Dae Han Kim
, Hyun Ook Seo
, Myung Geun Jeong
, Young Dok Kim

Department of Chemistry

Sungkyunkwan University

Research output: Contribution to journal › Article › peer-review

19 Scopus citations

Abstract

CO₂ reforming of CH₄ catalyzed by porous SiO ₂ and TiO₂/SiO₂-supported Ni was studied. Ni on the porous substrates was deposited using atomic layer deposition method, and after the catalytic reactions, Ni nanoparticles confined within the pores of the substrates were found. Both catalysts showed comparable catalytic activity and stability. The bare SiO₂-supported catalyst showed very stable reactivity for the reforming reaction with an activity loss of ∼10 % at 850 °C during 29 days. Thus, the porous SiO₂-supported Ni which is uniformly deposited in interior of the support could be one of the promising catalysts for CO₂ reforming of CH₄.

Original language	English
Pages (from-to)	56-61
Number of pages	6
Journal	Catalysis Letters
Volume	144
Issue number	1
DOIs	https://doi.org/10.1007/s10562-013-1152-x
State	Published - Jan 2014

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This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 13 Climate Action

Keywords

Atomic layer deposition
CO reforming of CH
Ni
Porous silica

Access to Document

10.1007/s10562-013-1152-x

Cite this

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title = "Reactivity and stability of ni nanoparticles supported by mesoporous SiO2 and TiO2/SiO2 for CO2 reforming of CH4",

abstract = "CO2 reforming of CH4 catalyzed by porous SiO 2 and TiO2/SiO2-supported Ni was studied. Ni on the porous substrates was deposited using atomic layer deposition method, and after the catalytic reactions, Ni nanoparticles confined within the pores of the substrates were found. Both catalysts showed comparable catalytic activity and stability. The bare SiO2-supported catalyst showed very stable reactivity for the reforming reaction with an activity loss of ∼10 \% at 850 °C during 29 days. Thus, the porous SiO2-supported Ni which is uniformly deposited in interior of the support could be one of the promising catalysts for CO2 reforming of CH4.",

keywords = "Atomic layer deposition, CO reforming of CH, Ni, Porous silica",

author = "Kim, \{Dae Han\} and Seo, \{Hyun Ook\} and Jeong, \{Myung Geun\} and Kim, \{Young Dok\}",

year = "2014",

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T1 - Reactivity and stability of ni nanoparticles supported by mesoporous SiO2 and TiO2/SiO2 for CO2 reforming of CH4

AU - Kim, Dae Han

AU - Seo, Hyun Ook

AU - Jeong, Myung Geun

AU - Kim, Young Dok

PY - 2014/1

Y1 - 2014/1

N2 - CO2 reforming of CH4 catalyzed by porous SiO 2 and TiO2/SiO2-supported Ni was studied. Ni on the porous substrates was deposited using atomic layer deposition method, and after the catalytic reactions, Ni nanoparticles confined within the pores of the substrates were found. Both catalysts showed comparable catalytic activity and stability. The bare SiO2-supported catalyst showed very stable reactivity for the reforming reaction with an activity loss of ∼10 % at 850 °C during 29 days. Thus, the porous SiO2-supported Ni which is uniformly deposited in interior of the support could be one of the promising catalysts for CO2 reforming of CH4.

AB - CO2 reforming of CH4 catalyzed by porous SiO 2 and TiO2/SiO2-supported Ni was studied. Ni on the porous substrates was deposited using atomic layer deposition method, and after the catalytic reactions, Ni nanoparticles confined within the pores of the substrates were found. Both catalysts showed comparable catalytic activity and stability. The bare SiO2-supported catalyst showed very stable reactivity for the reforming reaction with an activity loss of ∼10 % at 850 °C during 29 days. Thus, the porous SiO2-supported Ni which is uniformly deposited in interior of the support could be one of the promising catalysts for CO2 reforming of CH4.

KW - Atomic layer deposition

KW - CO reforming of CH

KW - Ni

KW - Porous silica

UR - https://www.scopus.com/pages/publications/84893878418

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SP - 56

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