Rapid Electrohydrodynamic-Driven Pattern Replication over a Large Area via Ultrahigh Voltage Pulses

Despite the prospects of electrohydrodynamic instability patterning (EHIP), poor process parameter controllability is a significant challenge in uniform large-scale nanopatterning. Herein, we introduce a EHIP process using an ultrahigh electric field (>10⁸ V/m) to effectively accelerate the pattern growth evolution. Owing to the strong dependence on a temporal parameter (1/τ_m) of the field strength, our method not only reduces the completion time of pattern growth but also overcomes critical parametric restrictions on the pattern replication, thereby enhancing the replicated pattern quality in three dimensions. The pattern can be uniformly replicated over the entire film surface even without a perfectly uniform air gap, which has been severely difficult in the conventional method. To further demonstrate how straightforward yet versatile our approach is, we applied our EHIP approach to successfully replicate the densely packed nanostructures of cicada wings.