Quasi-atomic layer etching of silicon with surface chlorination and removal using Ar or He plasmas
- Namgun Kim
- , Whan Kyun Kim
- , Dongjun Shin
- , Jong Kyu Kim
- , Chan Min Lee
- , Kuk Han Yoon
- , Youngju Ko
- , Heeyeop Chae
- Sungkyunkwan University
- Samsung
Research output: Contribution to journal › Article › peer-review
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