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Properties of SiOxNy thin film deposited by low temperature plasma enhanced chemical vapor deposition using TEOS-NH3-O2-N2 gas mixtures

  • J. H. Lee
  • , C. H. Jeong
  • , J. T. Lim
  • , N. G. Jo
  • , S. J. Kyung
  • , G. Y. Yeom
  • Sungkyunkwan University

Research output: Contribution to journal › Article › peer-review

14   Link opens in a new tab Scopus citations

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