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Precise depth control and low-damage atomic-layer etching of HfO 2using BCl3 and Ar neutral beam

  • S. D. Park
  • , W. S. Lim
  • , B. J. Park
  • , H. C. Lee
  • , J. W. Bae
  • , G. Y. Yeom
  • Sungkyunkwan University

Research output: Contribution to journal › Article › peer-review

33   Link opens in a new tab Scopus citations

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