Skip to main navigation Skip to search Skip to main content

Polysilicon Etchback Plasma Process Using HBr, Cl2, and SF6 Gas Mixtures for Deen-Trench Isolation

  • Silicon Systems Inc
  • Tektronix Incorporated

Research output: Contribution to journal › Article › peer-review

10   Link opens in a new tab Scopus citations

Fingerprint

Dive into the research topics of 'Polysilicon Etchback Plasma Process Using HBr, Cl2, and SF6 Gas Mixtures for Deen-Trench Isolation'. Together they form a unique fingerprint.
Sort by

Chemical Engineering