Polycrystalline Few-Layer Graphene as a Durable Anticorrosion Film for Copper

Zhijuan Zhao, Tianyu Hou, Nannan Wu, Shuping Jiao, Ke Zhou, Jun Yin, Ji Won Suk, Xu Cui, Mingfei Zhang, Shaopeng Li, Yan Qu, Weiguang Xie, Xi Bo Li, Chuanxi Zhao, Yong Fu, Rong Dun Hong, Shengshi Guo, Dingqu Lin, Weiwei Cai, Wenjie MaiZhengtang Luo, Yongtao Tian, Yun Lai, Yuanyue Liu, Luigi Colombo, Yufeng Hao

Research output: Contribution to journalArticlepeer-review

56 Scopus citations

Abstract

Corrosion of metals in atmospheric environments is a worldwide problem in industry and daily life. Traditional anticorrosion methods including sacrificial anodes or protective coatings have performance limitations. Here, we report atomically thin, polycrystalline few-layer graphene (FLG) grown by chemical vapor deposition as a long-term protective coating film for copper (Cu). A six-year old, FLG-protected Cu is visually shiny and detailed material characterizations capture no sign of oxidation. The success of the durable anticorrosion film depends on the misalignment of grain boundaries between adjacent graphene layers. Theoretical calculations further found that corrosive molecules always encounter extremely high energy barrier when diffusing through the FLG layers. Therefore, the FLG is able to prevent the corrosive molecules from reaching the underlying Cu surface. This work highlights the interesting structures of polycrystalline FLG and sheds insight into the atomically thin coatings for various applications.

Original languageEnglish
Pages (from-to)1161-1168
Number of pages8
JournalNano Letters
Volume21
Issue number2
DOIs
StatePublished - 27 Jan 2021
Externally publishedYes

Keywords

  • anticorrosion
  • chemical vapor deposition
  • few-layer graphene
  • grain boundaries
  • polycrystalline

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