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Poly-Trimethoxyphenylsilane as Carrier Film for Residual-Free CVD Graphene Transfer

  • Bum Jun Kim
  • , Nilesh K. Shrivastava
  • , Tuqeer Nasir
  • , Kyoung Soon Choi
  • , Jouhahn Lee
  • , Hak Chul Kim
  • , Kwan Woo Kim
  • , Mudusu Devika
  • , Sang Hoon Lee
  • , Byung Joo Jeong
  • , Hak Ki Yu
  • , Jae Young Choi
  • Sungkyunkwan University
  • Korea Basic Science Institute
  • Ajou University

Research output: Contribution to journalArticlepeer-review

Abstract

We synthesized poly-trimethoxyphenylsilane (PTMS) and applied it as the carrier film to CVD graphene transfer process for the first time. Since the PTMS particles are not fully crosslinked due to the presence of bulky groups, they do not have crystallinity in the long-range order on the graphene surface and are easily removed by solvent such as toluene. Raman, AFM, and X-ray photoemission (especially, Si 2p signal) analysis confirmed that the surface of the transferred graphene was clean without PTMS impurities.

Original languageEnglish
Article number1700240
JournalPhysica Status Solidi - Rapid Research Letters
Volume11
Issue number11
DOIs
StatePublished - Nov 2017

Keywords

  • chemical vapor deposition
  • graphene transfer
  • poly-trimethoxyphenylsilane
  • polymers
  • thin films

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