Plasma reactions of N2O on hydrogenated amorphous carbon films by PECVD

Y. T. Kim; S. G. Yoon; S. C. Jung; S. J. Suh; D. H. Yoon

doi:10.1016/j.surfcoat.2003.10.158

Plasma reactions of N₂O on hydrogenated amorphous carbon films by PECVD

Y. T. Kim, S. G. Yoon, S. C. Jung, S. J. Suh, D. H. Yoon

Department of Advanced Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

Diamond-like carbon (DLC, a-C:H) films were deposited by r.f. plasma-enhanced chemical vapor deposition of methane(CH₄) -nitrous oxide(N₂O)-hydrogen(H₂) mixtures onto silicon substrates. Increasing the r.f. power leads to the production of more radicals and to a deposition rate as high as 1380 Å h^-1 at r.f. power of 300 W, after which it decreases. As the r.f. power increases, the root-mean-square (RMS) roughness decreases. The RMS roughness of 2.2 Å was obtained at r.f. power of 300 W. The optical properties (the transmittance over a wide spectral range and refractive index) were determined by means of IR-spectroscopy and ellipsometric measurements. Surface morphology of DLC films with roughness below 10 Å was observed under atomic force microscopy.

Original language	English
Pages (from-to)	250-253
Number of pages	4
Journal	Surface and Coatings Technology
Volume	180-181
DOIs	https://doi.org/10.1016/j.surfcoat.2003.10.158
State	Published - 1 Mar 2004

Keywords

Annealing
Diamond-like carbon
Plasma-enhanced chemical vapor deposition

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10.1016/j.surfcoat.2003.10.158

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title = "Plasma reactions of N2O on hydrogenated amorphous carbon films by PECVD",

abstract = "Diamond-like carbon (DLC, a-C:H) films were deposited by r.f. plasma-enhanced chemical vapor deposition of methane(CH4) -nitrous oxide(N2O)-hydrogen(H2) mixtures onto silicon substrates. Increasing the r.f. power leads to the production of more radicals and to a deposition rate as high as 1380 {\AA} h-1 at r.f. power of 300 W, after which it decreases. As the r.f. power increases, the root-mean-square (RMS) roughness decreases. The RMS roughness of 2.2 {\AA} was obtained at r.f. power of 300 W. The optical properties (the transmittance over a wide spectral range and refractive index) were determined by means of IR-spectroscopy and ellipsometric measurements. Surface morphology of DLC films with roughness below 10 {\AA} was observed under atomic force microscopy.",

keywords = "Annealing, Diamond-like carbon, Plasma-enhanced chemical vapor deposition",

author = "Kim, \{Y. T.\} and Yoon, \{S. G.\} and Jung, \{S. C.\} and Suh, \{S. J.\} and Yoon, \{D. H.\}",

year = "2004",

month = mar,

day = "1",

doi = "10.1016/j.surfcoat.2003.10.158",

language = "English",

volume = "180-181",

pages = "250--253",

journal = "Surface and Coatings Technology",

issn = "0257-8972",

publisher = "Elsevier B.V.",

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TY - JOUR

T1 - Plasma reactions of N2O on hydrogenated amorphous carbon films by PECVD

AU - Kim, Y. T.

AU - Yoon, S. G.

AU - Jung, S. C.

AU - Suh, S. J.

AU - Yoon, D. H.

PY - 2004/3/1

Y1 - 2004/3/1

N2 - Diamond-like carbon (DLC, a-C:H) films were deposited by r.f. plasma-enhanced chemical vapor deposition of methane(CH4) -nitrous oxide(N2O)-hydrogen(H2) mixtures onto silicon substrates. Increasing the r.f. power leads to the production of more radicals and to a deposition rate as high as 1380 Å h-1 at r.f. power of 300 W, after which it decreases. As the r.f. power increases, the root-mean-square (RMS) roughness decreases. The RMS roughness of 2.2 Å was obtained at r.f. power of 300 W. The optical properties (the transmittance over a wide spectral range and refractive index) were determined by means of IR-spectroscopy and ellipsometric measurements. Surface morphology of DLC films with roughness below 10 Å was observed under atomic force microscopy.

AB - Diamond-like carbon (DLC, a-C:H) films were deposited by r.f. plasma-enhanced chemical vapor deposition of methane(CH4) -nitrous oxide(N2O)-hydrogen(H2) mixtures onto silicon substrates. Increasing the r.f. power leads to the production of more radicals and to a deposition rate as high as 1380 Å h-1 at r.f. power of 300 W, after which it decreases. As the r.f. power increases, the root-mean-square (RMS) roughness decreases. The RMS roughness of 2.2 Å was obtained at r.f. power of 300 W. The optical properties (the transmittance over a wide spectral range and refractive index) were determined by means of IR-spectroscopy and ellipsometric measurements. Surface morphology of DLC films with roughness below 10 Å was observed under atomic force microscopy.

KW - Annealing

KW - Diamond-like carbon

KW - Plasma-enhanced chemical vapor deposition

UR - https://www.scopus.com/pages/publications/16744365045

U2 - 10.1016/j.surfcoat.2003.10.158

DO - 10.1016/j.surfcoat.2003.10.158

M3 - Article

AN - SCOPUS:16744365045

SN - 0257-8972

VL - 180-181

SP - 250

EP - 253

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

ER -

Plasma reactions of N₂O on hydrogenated amorphous carbon films by PECVD

Abstract

Keywords

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