Plasma damage free sputtering of Ti-doped In2O3 film on Ag nanowire network for transparent and flexible electrodes

Ki Won Seo; Han Ki Kim

doi:10.1016/j.tsf.2015.03.073

Plasma damage free sputtering of Ti-doped In₂O₃ film on Ag nanowire network for transparent and flexible electrodes

Ki Won Seo
, Han Ki Kim

Kyung Hee University

Research output: Contribution to journal › Article › peer-review

7 Scopus citations

Abstract

We have investigated the electrical, optical, morphological, and mechanical properties of conducting Ti-doped In₂O₃ (TIO)-coated Ag NW network films as a function of the thickness of TIO layer to apply as transparent and flexible electrodes. By using linear facing target sputtering, the TIO layer was uniformly covered on the Ag NW without plasma damage. Due to high conductivity and optical transmittance of Ag NW, the 10 nm-thick TIO coated Ag NWs showed a low sheet resistance of 67.62 ω/sq and an optical transmittance of 86.9%. The effective coating of the conducting TIO passivation layer led to improvement of stability of the Ag NW network. In addition, constant resistance change of TIO-coated Ag NW network film indicates that the coating of the TIO layer cannot affect the flexibility of Ag NW network. These results demonstrate that TIO-coated Ag NW network is a promising hybrid electrode for next generation flexible devices.

Original language	English
Pages (from-to)	301-304
Number of pages	4
Journal	Thin Solid Films
Volume	591
DOIs	https://doi.org/10.1016/j.tsf.2015.03.073
State	Published - 30 Sep 2015
Externally published	Yes

Keywords

Flexibility
Flexible electrodes
Linear facing target sputtering
Plasma damage
Silver nanowires
Titanium-doped indium oxide

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10.1016/j.tsf.2015.03.073

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@article{c339aad568b8426393f6ef0b219a04cc,

title = "Plasma damage free sputtering of Ti-doped In2O3 film on Ag nanowire network for transparent and flexible electrodes",

abstract = "We have investigated the electrical, optical, morphological, and mechanical properties of conducting Ti-doped In2O3 (TIO)-coated Ag NW network films as a function of the thickness of TIO layer to apply as transparent and flexible electrodes. By using linear facing target sputtering, the TIO layer was uniformly covered on the Ag NW without plasma damage. Due to high conductivity and optical transmittance of Ag NW, the 10 nm-thick TIO coated Ag NWs showed a low sheet resistance of 67.62 ω/sq and an optical transmittance of 86.9\%. The effective coating of the conducting TIO passivation layer led to improvement of stability of the Ag NW network. In addition, constant resistance change of TIO-coated Ag NW network film indicates that the coating of the TIO layer cannot affect the flexibility of Ag NW network. These results demonstrate that TIO-coated Ag NW network is a promising hybrid electrode for next generation flexible devices.",

keywords = "Flexibility, Flexible electrodes, Linear facing target sputtering, Plasma damage, Silver nanowires, Titanium-doped indium oxide",

author = "Seo, \{Ki Won\} and Kim, \{Han Ki\}",

note = "Publisher Copyright: {\textcopyright} 2015 Elsevier B.V.",

year = "2015",

month = sep,

day = "30",

doi = "10.1016/j.tsf.2015.03.073",

language = "English",

volume = "591",

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journal = "Thin Solid Films",

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TY - JOUR

T1 - Plasma damage free sputtering of Ti-doped In2O3 film on Ag nanowire network for transparent and flexible electrodes

AU - Seo, Ki Won

AU - Kim, Han Ki

PY - 2015/9/30

Y1 - 2015/9/30

N2 - We have investigated the electrical, optical, morphological, and mechanical properties of conducting Ti-doped In2O3 (TIO)-coated Ag NW network films as a function of the thickness of TIO layer to apply as transparent and flexible electrodes. By using linear facing target sputtering, the TIO layer was uniformly covered on the Ag NW without plasma damage. Due to high conductivity and optical transmittance of Ag NW, the 10 nm-thick TIO coated Ag NWs showed a low sheet resistance of 67.62 ω/sq and an optical transmittance of 86.9%. The effective coating of the conducting TIO passivation layer led to improvement of stability of the Ag NW network. In addition, constant resistance change of TIO-coated Ag NW network film indicates that the coating of the TIO layer cannot affect the flexibility of Ag NW network. These results demonstrate that TIO-coated Ag NW network is a promising hybrid electrode for next generation flexible devices.

AB - We have investigated the electrical, optical, morphological, and mechanical properties of conducting Ti-doped In2O3 (TIO)-coated Ag NW network films as a function of the thickness of TIO layer to apply as transparent and flexible electrodes. By using linear facing target sputtering, the TIO layer was uniformly covered on the Ag NW without plasma damage. Due to high conductivity and optical transmittance of Ag NW, the 10 nm-thick TIO coated Ag NWs showed a low sheet resistance of 67.62 ω/sq and an optical transmittance of 86.9%. The effective coating of the conducting TIO passivation layer led to improvement of stability of the Ag NW network. In addition, constant resistance change of TIO-coated Ag NW network film indicates that the coating of the TIO layer cannot affect the flexibility of Ag NW network. These results demonstrate that TIO-coated Ag NW network is a promising hybrid electrode for next generation flexible devices.

KW - Flexibility

KW - Flexible electrodes

KW - Linear facing target sputtering

KW - Plasma damage

KW - Silver nanowires

KW - Titanium-doped indium oxide

UR - https://www.scopus.com/pages/publications/84942820449

U2 - 10.1016/j.tsf.2015.03.073

DO - 10.1016/j.tsf.2015.03.073

M3 - Article

AN - SCOPUS:84942820449

SN - 0040-6090

VL - 591

SP - 301

EP - 304

JO - Thin Solid Films

JF - Thin Solid Films

ER -

Plasma damage free sputtering of Ti-doped In₂O₃ film on Ag nanowire network for transparent and flexible electrodes

Abstract

Keywords

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