Plasma Atomic Layer Etching of SiO2 and Si3N4 with Low Global Warming C4H3F7O Isomers

Research output: Contribution to journal › Article › peer-review

12   Link opens in a new tab Scopus citations

Fingerprint

Dive into the research topics of 'Plasma Atomic Layer Etching of SiO2 and Si3N4 with Low Global Warming C4H3F7O Isomers'. Together they form a unique fingerprint.
Sort by

Chemistry

Material Science