Abstract
In this study, using two different linear internal-type inductively coupled plasma sources with a serpentine-type antenna arid a novel double-comb-type antenna having the size of 1,020 mm × X 830 mm, are compared the characteristics of plasmas for the application to the flat panel display manufacturing. The use of the double-comb-type antenna instead of the serpentine-type antenna showed a higher plasma density, a higher radical density, and more plasma stability when an inductive power higher than 2000 W was applied to the source, By the application of a 5000 W inductive power with 15 mTorr Ar, a high plasma density of 2.2 × 10 -1/cm 3 with a plasma uniformity of 8 % could be obtained for the double-comb-type antenna. The increases in the plasma density, the radical density, and the plasrna stability for the double comb-type antenna compared to the serpentine-type antenna are due to its higher inductive coupling and lower standing wave effect.
| Original language | English |
|---|---|
| Pages (from-to) | 422-426 |
| Number of pages | 5 |
| Journal | Journal of the Korean Physical Society |
| Volume | 48 |
| Issue number | 3 |
| State | Published - Mar 2006 |
Keywords
- Display
- Etching
- Large area
- Plasma
