Plasma and antenna characteristics of a linearly extended inductively coupled plasma system using multi-polar magnetic field

Kyong Nam Kim; Jong Hyeuk Lim; Geun Young Yeom

doi:10.1016/j.tsf.2006.10.057

Plasma and antenna characteristics of a linearly extended inductively coupled plasma system using multi-polar magnetic field

Kyong Nam Kim
, Jong Hyeuk Lim
, Geun Young Yeom

Department of Advanced Materials Science and Engineering

Sungkyunkwan University

Research output: Contribution to journal › Article › peer-review

7 Scopus citations

Abstract

A novel internal-type linear inductive antenna, referred to as a "double comb-type antenna", was used as a large-area plasma source with a substrate area of 880 mm × 660 mm. This study investigated the effect of a multi-polar magnetic field on plasma confinement. High density plasma in the order of 3.2 × 10¹¹ cm^{- 3}, which is 50% higher than that obtained for a source without a magnetic field, with good plasma stability was obtained at a pressure of 15 mTorr Ar and an RF power of 5000 W. Plasma uniformity < 3% within the substrate area was also obtained.

Original language	English
Pages (from-to)	5193-5196
Number of pages	4
Journal	Thin Solid Films
Volume	515
Issue number	12
DOIs	https://doi.org/10.1016/j.tsf.2006.10.057
State	Published - 23 Apr 2007

Keywords

Display
ICP
Large-area
Magnetic confinement

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10.1016/j.tsf.2006.10.057

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title = "Plasma and antenna characteristics of a linearly extended inductively coupled plasma system using multi-polar magnetic field",

abstract = "A novel internal-type linear inductive antenna, referred to as a {"}double comb-type antenna{"}, was used as a large-area plasma source with a substrate area of 880 mm × 660 mm. This study investigated the effect of a multi-polar magnetic field on plasma confinement. High density plasma in the order of 3.2 × 1011 cm- 3, which is 50\% higher than that obtained for a source without a magnetic field, with good plasma stability was obtained at a pressure of 15 mTorr Ar and an RF power of 5000 W. Plasma uniformity < 3\% within the substrate area was also obtained.",

keywords = "Display, ICP, Large-area, Magnetic confinement",

author = "Kim, \{Kyong Nam\} and Lim, \{Jong Hyeuk\} and Yeom, \{Geun Young\}",

year = "2007",

month = apr,

day = "23",

doi = "10.1016/j.tsf.2006.10.057",

language = "English",

volume = "515",

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journal = "Thin Solid Films",

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TY - JOUR

T1 - Plasma and antenna characteristics of a linearly extended inductively coupled plasma system using multi-polar magnetic field

AU - Kim, Kyong Nam

AU - Lim, Jong Hyeuk

AU - Yeom, Geun Young

PY - 2007/4/23

Y1 - 2007/4/23

N2 - A novel internal-type linear inductive antenna, referred to as a "double comb-type antenna", was used as a large-area plasma source with a substrate area of 880 mm × 660 mm. This study investigated the effect of a multi-polar magnetic field on plasma confinement. High density plasma in the order of 3.2 × 1011 cm- 3, which is 50% higher than that obtained for a source without a magnetic field, with good plasma stability was obtained at a pressure of 15 mTorr Ar and an RF power of 5000 W. Plasma uniformity < 3% within the substrate area was also obtained.

AB - A novel internal-type linear inductive antenna, referred to as a "double comb-type antenna", was used as a large-area plasma source with a substrate area of 880 mm × 660 mm. This study investigated the effect of a multi-polar magnetic field on plasma confinement. High density plasma in the order of 3.2 × 1011 cm- 3, which is 50% higher than that obtained for a source without a magnetic field, with good plasma stability was obtained at a pressure of 15 mTorr Ar and an RF power of 5000 W. Plasma uniformity < 3% within the substrate area was also obtained.

KW - Display

KW - ICP

KW - Large-area

KW - Magnetic confinement

UR - https://www.scopus.com/pages/publications/33947126437

U2 - 10.1016/j.tsf.2006.10.057

DO - 10.1016/j.tsf.2006.10.057

M3 - Article

AN - SCOPUS:33947126437

SN - 0040-6090

VL - 515

SP - 5193

EP - 5196

JO - Thin Solid Films

JF - Thin Solid Films

IS - 12

ER -

Plasma and antenna characteristics of a linearly extended inductively coupled plasma system using multi-polar magnetic field

Abstract

Keywords

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