Pioneering energy storage using facing-target sputtered Al2O3 protection layer on Ni-rich NCM622 cathode for high-efficiency all-solid-state thin-film batteries

  • Subhashree Behera
  • , Chandan Kumar Panda
  • , Saac Lee
  • , Ilgyu Kim
  • , Ho Jin Lee
  • , Jungseek Hwang
  • , Soon Gil Yoon
  • , Dae Woong Kim
  • , Seong Cheol Jang
  • , Woongpyo Hong
  • , Ji Won Jung
  • , Hyun Suk Kim

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

Thin-film batteries provide compact and efficient energy storage, but their performance is limited by interfacial instability and low energy density. To overcome these challenges, we employ Ni-rich NCM622 thin-film cathodes and introduce a facing-target sputtered (FTS) Al2O3 protective layer. FTS enables precise, damage-free deposition, significantly improving the cathode-electrolyte interface by minimizing plasma-induced defects. Annealing at 500 °C optimizes crystallinity while reducing surface cracking. The FTS-Al2O3 coating enhances electrochemical stability, achieving 91 % cyclability retention over 400 cycles in a liquid electrolyte. A full cell with a thin-film NCM622 cathode with FTS-Al2O3 protection and a carbon anode delivers 325.3 mAh cm−3, maintaining 77.8 % of its capacity after 100 cycles. Furthermore, an all-solid-state thin-film battery with LiPON and lithium film anode achieves an energy density of 50.98 mWh cm−3. These findings underscore the critical role of FTS-deposited Al2O3 in stabilizing interfaces and advancing all-solid-state thin-film batteries for miniaturized applications.

Original languageEnglish
Article number167123
JournalChemical Engineering Journal
Volume522
DOIs
StatePublished - 15 Oct 2025

Keywords

  • All-solid-state batteries
  • Cathodes
  • Facing-target sputtering
  • Magnetron sputtering
  • Plasma-enhanced atomic layer deposition

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