Abstract
Thin-film batteries provide compact and efficient energy storage, but their performance is limited by interfacial instability and low energy density. To overcome these challenges, we employ Ni-rich NCM622 thin-film cathodes and introduce a facing-target sputtered (FTS) Al2O3 protective layer. FTS enables precise, damage-free deposition, significantly improving the cathode-electrolyte interface by minimizing plasma-induced defects. Annealing at 500 °C optimizes crystallinity while reducing surface cracking. The FTS-Al2O3 coating enhances electrochemical stability, achieving 91 % cyclability retention over 400 cycles in a liquid electrolyte. A full cell with a thin-film NCM622 cathode with FTS-Al2O3 protection and a carbon anode delivers 325.3 mAh cm−3, maintaining 77.8 % of its capacity after 100 cycles. Furthermore, an all-solid-state thin-film battery with LiPON and lithium film anode achieves an energy density of 50.98 mWh cm−3. These findings underscore the critical role of FTS-deposited Al2O3 in stabilizing interfaces and advancing all-solid-state thin-film batteries for miniaturized applications.
| Original language | English |
|---|---|
| Article number | 167123 |
| Journal | Chemical Engineering Journal |
| Volume | 522 |
| DOIs | |
| State | Published - 15 Oct 2025 |
Keywords
- All-solid-state batteries
- Cathodes
- Facing-target sputtering
- Magnetron sputtering
- Plasma-enhanced atomic layer deposition