Photolithographic Patterning of Electrically Conducting Polypyrrole Film

The micro-patterns of electrically conducting polypyrrole (PPy) with line width as low as 30 µm have been successfully achieved using a photolithographic method. PPy as a conducting pattern was chemically polymerized within the poly (vinyl alcohol) (PVA) matrix layer where ferric p -toluenesulfonate as an oxidant was embedded in a designed architecture. Surface resistivity and transmittance at 600 nm of PPy regions were in the range of 10 3 ∼10 5 Ω/□ and 50%∼90%, respectively. The resistances of PPy patterns were in the range of 10 4 ∼10 6 Ω, which is lower than that of PVA region by about 10 10 times.