Photocure behavior of highly transparent and thermally stable photosensitive polymer

  • Jung Hwan Bae
  • , Myoung Soo Choi
  • , Whan Gun Kim
  • , Youngdon Kwon
  • , Jun Young Lee

Research output: Contribution to journalConference articlepeer-review

5 Scopus citations

Abstract

A new photosensitive prepolymer was designed and synthesized by esterification of an epoxy and methacrylic acid. Photopolymerization behavior of the prepolymer was quantitatively investigated by FT-IR spectroscopy. We also studied thermal stability by observing changes in the transmittance of the polymer film upon heating at 250°C for a given period of time.

Original languageEnglish
Pages (from-to)313-316
Number of pages4
JournalMolecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals
Volume377
DOIs
StatePublished - 2002
EventProceedings of the Korea-Japan Joint Forum on Organic Materials for Electronics and Photonics (KJF2001) - Seoul, Korea, Republic of
Duration: 25 Sep 200127 Sep 2001

Keywords

  • Photocure behavior
  • Photosensitive polymer
  • Quantitative FT-IR spectroscopy
  • Thermal stability

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