Abstract
A new photosensitive prepolymer was designed and synthesized by esterification of an epoxy and methacrylic acid. Photopolymerization behavior of the prepolymer was quantitatively investigated by FT-IR spectroscopy. We also studied thermal stability by observing changes in the transmittance of the polymer film upon heating at 250°C for a given period of time.
| Original language | English |
|---|---|
| Pages (from-to) | 313-316 |
| Number of pages | 4 |
| Journal | Molecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals |
| Volume | 377 |
| DOIs | |
| State | Published - 2002 |
| Event | Proceedings of the Korea-Japan Joint Forum on Organic Materials for Electronics and Photonics (KJF2001) - Seoul, Korea, Republic of Duration: 25 Sep 2001 → 27 Sep 2001 |
Keywords
- Photocure behavior
- Photosensitive polymer
- Quantitative FT-IR spectroscopy
- Thermal stability