Abstract
Two dimensional micromirror array(MMA) is designed and fabricated to be used as a spatial light modulator for biochip fabrication. The optical projection system is setup using the MMA for maskless photolithography process, which is applied to photochemical surface modification. The photoresist (AZ1512) pattern is fabricated by the MMA projection in the maskless photolithography system, which consists of MMA and other optical components like projection lens. The patterned PR on a chip substrate is analyzed to improve pattern edge definition. The parameters of the optical system, which are lens location, incident angle of the UV light and the MMA location, are adjusted to obtain fine pattern edge definition by the MMA deflection. To immobilize proteins on the specific surface regions of a chip substrate to make protein patterning, nitroveratryloxycarbonyl(NVOC) group is used as a photolabile protecting group. The surface which is protected by NVOC group, is selectively irradiated by UV illuminator using the MMA. After removing the NVOC group, FITC(fluorescein isothianade) is tagged to the NVOC-cleaved site to find out the photo-cleavage condition of NOVC group by UV irradiation in the maskless photolithography system. Using the photocleavage condition, biotin was coupled to the NVOC-cleaved site. Then, we could obtain streptavidin-patterned surface.
| Original language | English |
|---|---|
| Pages (from-to) | 352-359 |
| Number of pages | 8 |
| Journal | Proceedings of SPIE - The International Society for Optical Engineering |
| Volume | 4557 |
| DOIs | |
| State | Published - 2001 |
| Externally published | Yes |
| Event | Micromachining and Microfabrication Process Technology VII - San Francisco, CA, United States Duration: 22 Oct 2001 → 24 Oct 2001 |
Keywords
- Maskless photolithography
- Micromirror array
- Protein patterning
- Surface modification