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PbZrxTi1-xO3 ferroelectric thin-film capacitors for flexible nonvolatile memory applications

  • Jonghyun Rho
  • , Sang Jin Kim
  • , Wook Heo
  • , Nae Eung Lee
  • , Hwan Soo Lee
  • , Jong Hyun Ahn
  • Sungkyunkwan University
  • Samsung

Research output: Contribution to journalArticlepeer-review

Abstract

This letter reports the fabrication of PbZrxTi 1-xO3 (PZT) thin-film capacitors on flexible plastic substrates. The PZT film was formed on a wafer using a solgel method and transferred to a thin plastic substrate using an elastomeric stamp. The PZT film on the plastic substrate showed a well-saturated hysteresis loop with a P r of ∼20μC/cm2 and a Vc of ∼1.1 V at a supplied voltage of 3 V, which are similar to those observed for PZT films on rigid wafers, as well as stable operation under an 8-mm bending radius. These characteristics suggest promising applications in flexible electronic systems.

Original languageEnglish
Article number5512660
Pages (from-to)1017-1019
Number of pages3
JournalIEEE Electron Device Letters
Volume31
Issue number9
DOIs
StatePublished - Sep 2010
Externally publishedYes

Keywords

  • Ferroelectric
  • flexible electronics
  • nonvolatile memory
  • PZT

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