Patterning of Si3N4 layer in pulse-biased capacitively-coupled plasmas for multi-level hard mask structures
- Gyuhyun Choi
- , Sechan Kim
- , Haegyu Jang
- , Heeyeop Chae
- , Nae Eung Lee
- Sungkyunkwan University
Research output: Contribution to journal › Article › peer-review
2
Link opens in a new tab
Scopus
citations